Inventor
WAKAMATSU GOJI
JP13 patents
Patents
13 patentsUS10078265B2Sep 18, 2018
Pattern-forming method, resin, and composition
JSR CORP3 citations71
US9620378B1Apr 11, 2017
Composition for film formation, film, production method of patterned substrate, and compound
JSR CORP2 citations71
US9958781B2May 1, 2018
Method for film formation, and pattern-forming method
JSR CORP2 citations70
US9581905B2Feb 28, 2017
Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compound
JSR CORP6 citations68
US9412593B2Aug 9, 2016
Composition for film formation, resist underlayer film, and forming method of resist underlayer film, and pattern-forming method
JSR CORP2 citations61
US11243468B2Feb 8, 2022
Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production method
JSR CORP1 citations56
US11320739B2May 3, 2022
Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate
JSR CORP0 citations50
US11126084B2Sep 21, 2021
Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound
JSR CORP0 citations50
US10520814B2Dec 31, 2019
Resist underlayer film-forming composition, resist underlayer film, resist underlayer film-forming process, and production method of patterned substrate
JSR CORP0 citations40
US10423083B2Sep 24, 2019
Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate
JSR CORP0 citations40
US10053539B2Aug 21, 2018
Composition for film formation, film, production method of patterned substrate, and compound
JSR CORP0 citations40
US9259668B2Feb 16, 2016
Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate
JSR CORP0 citations40
US8883023B2Nov 11, 2014
Method for forming pattern
JSR CORP0 citations33