Inventor
SUMIYA MASAHIRO
JP46 patents
⚠️ This page may combine multiple inventors who share the name “SUMIYA MASAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
38 patentsUS7373899B2May 20, 2008
Plasma processing apparatus using active matching
HITACHI HIGH TECH CORP46 citations96
US7169255B2Jan 30, 2007
Plasma processing apparatus
HITACHI HIGH TECH CORP30 citations93
US7029594B2Apr 18, 2006
Plasma processing method
HITACHI HIGH TECH CORP19 citations93
US7615132B2Nov 10, 2009
Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method
HITACHI HIGH TECH CORP16 citations84
US9496147B2Nov 15, 2016
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP5 citations83
US12191121B2Jan 7, 2025
Plasma processing apparatus
HITACHI HIGH TECH CORP2 citations74
US11664233B2May 30, 2023
Method for releasing sample and plasma processing apparatus using same
HITACHI HIGH TECH CORP2 citations73
US11257661B2Feb 22, 2022
Plasma processing apparatus
HITACHI HIGH TECH CORP3 citations73
US10510519B2Dec 17, 2019
Plasma processing apparatus and data analysis apparatus
HITACHI HIGH TECH CORP3 citations73
US10184173B1Jan 22, 2019
Plasma processing method
HITACHI HIGH TECH CORP5 citations67
US12148633B2Nov 19, 2024
Plasma processing apparatus and method for releasing sample
HITACHI HIGH TECH CORP0 citations62
US12112925B2Oct 8, 2024
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations62
US11538671B2Dec 27, 2022
Plasma processing apparatus and data analysis apparatus
HITACHI HIGH TECH CORP0 citations62
US11424108B2Aug 23, 2022
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations62
US11315792B2Apr 26, 2022
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations62
US11107694B2Aug 31, 2021
Method for releasing sample and plasma processing apparatus using same
HITACHI HIGH TECH CORP0 citations62
US9960031B2May 1, 2018
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP1 citations62
US7771608B2Aug 10, 2010
Plasma processing method and apparatus
HITACHI HIGH TECH CORP4 citations62
US12080529B2Sep 3, 2024
Plasma processing apparatus and prediction method of the condition of plasma processing apparatus
HITACHI HIGH TECH CORP0 citations60
US11107664B2Aug 31, 2021
Plasma processing apparatus and prediction apparatus of the condition of plasma processing apparatus
HITACHI HIGH TECH CORP1 citations60
US10886110B2Jan 5, 2021
Plasma processing apparatus and prediction method of the condition of plasma processing apparatus
HITACHI HIGH TECH CORP0 citations60
US7585776B2Sep 8, 2009
Dry etching method of insulating film
HITACHI HIGH TECH CORP2 citations60
US12368031B2Jul 22, 2025
Plasma processing method
HITACHI HIGH TECH CORP0 citations59
US11355324B2Jun 7, 2022
Plasma processing method
HITACHI HIGH TECH CORP0 citations59
US12494348B2Dec 9, 2025
Plasma processing apparatus and member of plasma processing chamber
HITACHI HIGH TECH CORP0 citations52
US12050455B2Jul 30, 2024
State prediction apparatus and semiconductor manufacturing apparatus
HITACHI HIGH TECH CORP0 citations52
US11742214B2Aug 29, 2023
Plasma processing method
HITACHI HIGH TECH CORP0 citations52
US10825700B2Nov 3, 2020
Plasma processing apparatus and method for releasing sample
HITACHI HIGH TECH CORP0 citations52
US10490412B2Nov 26, 2019
Method for releasing sample and plasma processing apparatus using same
HITACHI HIGH TECH CORP0 citations52
US10395935B2Aug 27, 2019
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations52
US9941133B2Apr 10, 2018
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations52
US12040167B2Jul 16, 2024
Diagnosis apparatus, plasma processing apparatus and diagnosis method
HITACHI HIGH TECH CORP0 citations51
US12564002B2Feb 24, 2026
Diagnostic device, semiconductor manufacturing equipment system, semiconductor equipment manufacturing system, and diagnostic method
HITACHI HIGH TECH CORP0 citations50
US12444591B2Oct 14, 2025
Diagnosis device, diagnosis method, plasma processing apparatus, and semiconductor device manufacturing system
HITACHI HIGH TECH CORP0 citations50
US12387921B2Aug 12, 2025
Apparatus diagnostic apparatus, apparatus diagnostic method, plasma processing apparatus and semiconductor device manufacturing system
HITACHI HIGH TECH CORP0 citations50
US12154765B2Nov 26, 2024
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations49
US12530023B2Jan 20, 2026
Apparatus diagnostic system, apparatus diagnostic apparatus, semiconductor device manufacturing system, and apparatus diagnostic method
HITACHI HIGH TECH CORP0 citations48
US12573593B2Mar 10, 2026
Plasma processing method
HITACHI HIGH TECH CORP0 citations47
HITACHI LTD
4 patentsUS6777037B2Aug 17, 2004
Plasma processing method and apparatus
HITACHI LTD100 citations98
US6875366B2Apr 5, 2005
Plasma processing apparatus and method with controlled biasing functions
HITACHI LTD22 citations92
US6806201B2Oct 19, 2004
Plasma processing apparatus and method using active matching
HITACHI LTD12 citations74
US5886473AMar 23, 1999
Surface wave plasma processing apparatus
HITACHI LTD14 citations74