Inventor
SHA JING
US19 patents
⚠️ This page may combine multiple inventors who share the name “SHA JING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
18 patentsUS11301748B2Apr 12, 2022
Automatic feature extraction from aerial images for test pattern sampling and pattern coverage inspection for lithography
IBM11 citations85
US10831976B1Nov 10, 2020
Predicting local layout effects in circuit design patterns
IBM11 citations85
US10539881B1Jan 21, 2020
Generation of hotspot-containing physical design layout patterns
IBM15 citations85
US10706200B2Jul 7, 2020
Generative adversarial networks for generating physical design layout patterns of integrated multi-layers
IBM9 citations84
US10699055B2Jun 30, 2020
Generative adversarial networks for generating physical design layout patterns
IBM9 citations84
US10621302B2Apr 14, 2020
Classification and localization of hotspots in integrated physical design layouts
IBM9 citations84
US10599807B2Mar 24, 2020
Automatic generation of via patterns with coordinate-based recurrent neural network (RNN)
IBM5 citations84
US11189566B2Nov 30, 2021
Tight pitch via structures enabled by orthogonal and non-orthogonal merged vias
IBM2 citations73
US10990747B2Apr 27, 2021
Automatic generation of via patterns with coordinate-based recurrent neural network (RNN)
IBM2 citations73
US10706205B2Jul 7, 2020
Detecting hotspots in physical design layout patterns utilizing hotspot detection model with data augmentation
IBM3 citations73
US10621301B2Apr 14, 2020
Coordinates-based variational autoencoder for generating synthetic via layout patterns
IBM3 citations73
US10606975B2Mar 31, 2020
Coordinates-based generative adversarial networks for generating synthetic physical design layout patterns
IBM6 citations73
US10592635B2Mar 17, 2020
Generating synthetic layout patterns by feedforward neural network based variational autoencoders
IBM5 citations73
US10579764B2Mar 3, 2020
Co-modeling post-lithography critical dimensions and post-etch critical dimensions with multi-task neural networks
IBM3 citations72
US10621295B2Apr 14, 2020
Incorporation of process variation contours in design rule and risk estimation aspects of design for manufacturability to increase fabrication yield
IBM1 citations61
US10657420B2May 19, 2020
Modeling post-lithography stochastic critical dimension variation with multi-task neural networks
IBM0 citations41
US10768532B2Sep 8, 2020
Co-optimization of lithographic and etching processes with complementary post exposure bake by laser annealing
IBM0 citations39
US10678971B2Jun 9, 2020
Space exploration with Bayesian inference
IBM0 citations38