Inventor

LIN HUA-TAI

TW64 patents

⚠️ This page may combine multiple inventors who share the name “LIN HUA-TAI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIN HUA-TAI

TAIWAN SEMICONDUCTOR MFG CO LTD

Method for improving circuit layout for manufacturability

Method and apparatus for integrated circuit mask patterning

Method for removing semiconductor fins using alternating masks

Method for manufacturing semiconductor device and system for performing the same

Method for manufacturing semiconductor device and system for performing the same

Method and apparatus for extracting systematic defects

Method of manufacturing semiconductor devices

Method and apparatus for integrated circuit mask patterning

Method of lithographic process evaluation

OPC method with higher degree of freedom

Thin-film non-uniform stress evaluation

Dual critical dimension patterning

EUV photomask

EUV mask

Structure for chip extension

Method of manufacturing semiconductor structure with spacer on photoresist layer

Method of manufacturing a semiconductor device

Method and apparatus for integrated circuit mask patterning

Method for improving circuit layout for manufacturability

Etch monitoring and performing

Method of manufacturing semiconductor devices

Memory device and manufacturing method thereof

Etch monitoring and performing

Method for evaluating non-uniform stress

Feature patterning using pitch relaxation and directional end-pushing with ion bombardment

Method for inspecting pattern defects

Feature patterning using pitch relaxation and directional end-pushing with ion bombardment

TAIWAN SEMICONDUCTOR MFG

Removal of line end shortening in microlithography and mask set for removal

Method to prevent poison via

Method for proximity effect compensation on alternative phase-shift masks with bias and optical proximity correction

Method of forming a hole in the sub quarter micron range

Complementary replacement of material

Method of forming small contact holes using alternative phase shift masks and negative photoresist

Method and apparatus for extracting systematic defects

Method of forming small contact holes using alternative phase shift masks and negative photoresist

Method and system for improving printing accuracy of a contact layout

Dual damascene process

Method and apparatus for integrated circuit mask patterning

Methods for measuring photoresist dimensions

Photolithography scattering bar structure and method

VANGUARD INT SEMICONDUCT CORP

Overlay target pattern and algorithm for layer-to-layer overlay metrology for semiconductor processing

Method for improving patterning of a conductive layer in an integrated circuit

Anti-reflection oxynitride film for tungsten-silicide substrates

Alignment pattern and algorithm for photolithographic alignment marks on semiconductor substrates

Anti-reflection oxynitride film for polysilicon substrates

SHIN JAW-JUNG

Method for proximity correction

WANG HSIEN-CHENG

Photoresist materials and photolithography processes

CHANG CHIA-CHENG

Method and apparatus for enhanced optical proximity correction

HU JIA-RUI

Extraction of systematic defects

CHEN JHUN HUA

Method of patterning a semiconductor device having improved spacing and shape control and a semiconductor device