Inventor

BINNARD MICHAEL

US50 patents

⚠️ This page may combine multiple inventors who share the name “BINNARD MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BINNARD MICHAEL

NIKON CORP

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immerison fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Planar motor with linear coil arrays

Planar motor with linear coil arrays

Apparatus and methods for detecting tool-induced shift in microlithography apparatus

Stage device, exposure apparatus and method

Following stage planar motor

Wafer stage with magnetic bearings

Wafer stage assembly, servo control system, and method for operating the same

Active vibration isolation system having pressure control

Method and apparatus for operating a vibration isolation system having electronic and pneumatic control systems

Stage device, control system, and method for stabilizing wafer stage and wafer table

Microelectromechanical mirror assembly

Dual flow circulation system for a mover

Stage assembly and exposure apparatus including the same

Method and apparatus for operating a vibration isolation system having electronic and pneumatic control systems

Wafer stage chamber

Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage

Reaction mass for a stage device

Flexure supported wafer table

Wafer stage carrier and removal assembly

Circulation housing for a mover

Positioning system using surface pattern recognition and interpolation

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the protection lens during wafer exchange in an immersion lithography machine

Damper for a stage assembly

Dual flow circulation system for a mover

Quick chamber seals

Connection assembly of wafer stage chamber

Stage assembly with lightweight fine stage and low transmissibility

Positioning system using surface pattern recognition and interpolation

Stage counter mass system

Power minimizing controller for a stage assembly

Magnetic sensor calibration and servo for planar motor stage

System and method for controlling a stage assembly

BINNARD MICHAEL

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Apparatus for maintaining immersion fluid in the gap under the projection lens during wafer exchange using a co-planar member in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the projection lens using a pad member or second stage during wafer exchange in an immersion lithography machine

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage

NIPPON KOGAKU KK

Microelectromechanical mirror assembly