Inventor
LAN YONGQING
DE18 patents
⚠️ This page may combine multiple inventors who share the name “LAN YONGQING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
BASF SE
13 patentsUS11264250B2Mar 1, 2022
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE2 citations71
US10899945B2Jan 26, 2021
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates
BASF SE3 citations71
US10385236B2Aug 20, 2019
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE5 citations71
US9765239B2Sep 19, 2017
Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material
BASF SE2 citations69
US11286402B2Mar 29, 2022
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE0 citations60
US10738219B2Aug 11, 2020
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE0 citations50
US10570316B2Feb 25, 2020
Chemical mechanical polishing (CMP) composition
BASF SE0 citations50
US11993729B2May 28, 2024
Chemical mechanical polishing composition
BASF SE0 citations49
US10214663B2Feb 26, 2019
Chemical-mechanical polishing composition comprising organic/inorganic composite particles
BASF SE0 citations49
US10090159B2Oct 2, 2018
Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers
BASF SE0 citations48
US9862862B2Jan 9, 2018
Chemical-mechanical polishing compositions comprising polyethylene imine
BASF SE0 citations48
US9828527B2Nov 28, 2017
Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid
BASF SE1 citations48
US10227506B2Mar 12, 2019
Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium
BASF SE0 citations34
RAMAN VIJAY IMMANUEL
4 patentsUS8679980B2Mar 25, 2014
Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a CMP process
RAMAN VIJAY IMMANUEL6 citations70
US10392531B2Aug 27, 2019
Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process
RAMAN VIJAY IMMANUEL2 citations69
US9028708B2May 12, 2015
Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process
RAMAN VIJAY IMMANUEL0 citations47
US8747687B2Jun 10, 2014
Aqueous polishing agent comprising solid polymer particles and two complexing agents and its use in a process for polishing patterned and unstructured metal surfaces
RAMAN VIJAY IMMANUEL0 citations38