Inventor
SEAMONS MARTIN
US7 patents
Patents
7 patentsUS6413321B1Jul 2, 2002
Method and apparatus for reducing particle contamination on wafer backside during CVD process
APPLIED MATERIALS INC679 citations95
US6060397AMay 9, 2000
Gas chemistry for improved in-situ cleaning of residue for a CVD apparatus
APPLIED MATERIALS INC107 citations94
US6051284AApr 18, 2000
Chamber monitoring and adjustment by plasma RF metrology
APPLIED MATERIALS INC53 citations93
US6843881B2Jan 18, 2005
Detecting chemiluminescent radiation in the cleaning of a substrate processing chamber
APPLIED MATERIALS INC17 citations83
US6868856B2Mar 22, 2005
Enhanced remote plasma cleaning
APPLIED MATERIALS INC9 citations70
US11756796B2Sep 12, 2023
Techniques for improved low dielectric constant film processing
APPLIED MATERIALS INC0 citations59
US11798820B2Oct 24, 2023
Gas delivery systems and methods
APPLIED MATERIALS INC0 citations49