P

Inventor

FISCHER ANDREAS

SE194 patents
⚠️ This page may combine multiple inventors who share the name “FISCHER ANDREAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LAM RES CORP

19 patents
US6770166B1Aug 3, 2004

Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor

LAM RES CORP185 citations99
US7244336B2Jul 17, 2007

Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift

LAM RES CORP67 citations98
US6242360B1Jun 5, 2001

Plasma processing system apparatus, and method for delivering RF power to a plasma processing

LAM RES CORP107 citations98
US6841943B2Jan 11, 2005

Plasma processor with electrode simultaneously responsive to plural frequencies

LAM RES CORP115 citations96
US6744212B2Jun 1, 2004

Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions

LAM RES CORP94 citations95
US7837826B2Nov 23, 2010

Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof

LAM RES CORP22 citations93
US7740736B2Jun 22, 2010

Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber

LAM RES CORP40 citations93
US7578258B2Aug 25, 2009

Methods and apparatus for selective pre-coating of a plasma processing chamber

LAM RES CORP16 citations93
US7244311B2Jul 17, 2007

Heat transfer system for improved semiconductor processing uniformity

LAM RES CORP33 citations93
US7026174B2Apr 11, 2006

Method for reducing wafer arcing

LAM RES CORP24 citations93
US6562190B1May 13, 2003

System, apparatus, and method for processing wafer using single frequency RF power in plasma processing chamber

LAM RES CORP36 citations93
US6403322B1Jun 11, 2002

Acoustic detection of dechucking and apparatus therefor

LAM RES CORP15 citations93
US7861667B2Jan 4, 2011

Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode

LAM RES CORP23 citations92
US7597816B2Oct 6, 2009

Wafer bevel polymer removal

LAM RES CORP21 citations92
US7829468B2Nov 9, 2010

Method and apparatus to detect fault conditions of plasma processing reactor

LAM RES CORP22 citations90
US7879184B2Feb 1, 2011

Apparatuses, systems and methods for rapid cleaning of plasma confinement rings with minimal erosion of other chamber parts

LAM RES CORP12 citations84
US7837825B2Nov 23, 2010

Confined plasma with adjustable electrode area ratio

LAM RES CORP19 citations84
US7722778B2May 25, 2010

Methods and apparatus for sensing unconfinement in a plasma processing chamber

LAM RES CORP18 citations82
US10256108B2Apr 9, 2019

Atomic layer etching of AL2O3 using a combination of plasma and vapor treatments

LAM RES CORP7 citations81

OREXO AB

5 patents

FISCHER ANDREAS

5 patents

BEHR SYSTEMS INC

3 patents

BASF AG

3 patents

DUERR SYSTEMS GMBH

2 patents

DHINDSA RAJINDER

2 patents

HUDSON ERIC

1 patent

DEGUSSA

1 patent

DURR SYSTEMS INC

1 patent

GRUENENTHAL GMBH

1 patent

FORSCHUNGSZENTRUM JUELICH GMBH

1 patent

ZEISS CARL JENA GMBH

1 patent

NOLTE HANS-JURGEN

1 patent

VTI VENTIL TECHNIK GMBH

1 patent

BAYER AG

1 patent

VETTER KURT

1 patent

GE INSPECTION TECHNOLOGIES LP

1 patent

Showing the top 50 of 194 patents by PatentIndex Score.