Inventor

MACDONALD MATTHEW R

US32 patents

⚠️ This page may combine multiple inventors who share the name “MACDONALD MATTHEW R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MACDONALD MATTHEW R

VERSUM MAT US LLC

Organoaminosilane precursors and methods for depositing films comprising same

Compositions and methods using same for carbon doped silicon containing films

Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films

Organoaminosilane precursors and methods for depositing films comprising same

Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

Trisilylamine derivatives as precursors for high growth rate silicon-containing films

Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films

Compositions and methods using same for deposition of silicon-containing films

Organoaminosilanes and methods for making same

Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films

Organoaminodisilazanes for high temperature atomic layer deposition of silicon oxide thin films

Trisilylamine derivatives as precursors for high growth rate silicon-containing films

Silyl substituted organoamines as precursors for high growth rate silicon-containing films

Compositions and methods for the deposition of silicon oxide films

Compositions and methods for the deposition of silicon oxide films

Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

Compositions and methods using same for germanium seed layer

Functionalized cyclosilazanes as precursors for high growth rate silicon-containing films

Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

Deposition of carbon doped silicon oxide

Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials

Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials

Functionalized cyclosilazanes as precursors for high growth rate silicon-containing films

Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials

Organoaminosilane precursors and methods for depositing films comprising same

Silicon-based films and methods of forming the same

Organoamino-polysiloxanes for deposition of silicon-containing films

AIR PROD & CHEM

Organoaminosilanes and methods for making same

Organoaminosilanes and methods for making same

Silicon-based films and methods of forming the same

VERSON MAT US LLC

Organoaminosilane precursors and methods for depositing films comprising same