Inventor

FURUYA SANAE

JP10 patents

⚠️ This page may combine multiple inventors who share the name “FURUYA SANAE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIONO DAIJU

4 patents

US8221956B2Jul 17, 2012

Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound

SHIONO DAIJU20 citations91

US8642244B2Feb 4, 2014

Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound

SHIONO DAIJU3 citations61

US8475997B2Jul 2, 2013

Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound

SHIONO DAIJU2 citations61

US8742038B2Jun 3, 2014

Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound

SHIONO DAIJU0 citations51

TOKYO OHKA KOGYO CO LTD

4 patents

US7989138B2Aug 2, 2011

Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD7 citations83

US7914967B2Mar 29, 2011

Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD1 citations51

US8025923B2Sep 27, 2011

Method for manufacturing a structure

TOKYO OHKA KOGYO CO LTD1 citations47

US7741008B2Jun 22, 2010

Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method

TOKYO OHKA KOGYO CO LTD0 citations41

SHIMIZU HIROAKI

1 patent

US8088553B2Jan 3, 2012

Positive resist composition, method of forming resist pattern, and polymeric compound

SHIMIZU HIROAKI4 citations62

FURUYA SANAE

1 patent

US8298745B2Oct 30, 2012

Polymeric compound, positive resist composition, and method of forming resist pattern

FURUYA SANAE2 citations55