Inventor
DAGAN ELI
US10 patents
Patents
10 patentsUS11114350B2Sep 7, 2021
Method for removing photoresist from photomask substrate
APPLIED MATERIALS INC1 citations61
US11054746B2Jul 6, 2021
Portion of layer removal at substrate edge
APPLIED MATERIALS INC0 citations60
US10933624B2Mar 2, 2021
Photomask pellicle glue residue removal
APPLIED MATERIALS INC0 citations60
US10710358B2Jul 14, 2020
Photomask pellicle glue residue removal
APPLIED MATERIALS INC1 citations60
US10962889B2Mar 30, 2021
Method and apparatus for high throughput photomask curing
APPLIED MATERIALS INC0 citations57
US10928724B2Feb 23, 2021
Attachment feature removal from photomask in extreme ultraviolet lithography application
APPLIED MATERIALS INC0 citations57
US11964068B2Apr 23, 2024
Atomic oxygen and ozone cleaning device having a temperature control apparatus
APPLIED MATERIALS INC0 citations50
US11908679B2Feb 20, 2024
Atomic oxygen and ozone device for cleaning and surface treatment
APPLIED MATERIALS INC0 citations50
US11467508B2Oct 11, 2022
Pellicle adhesive residue removal system and methods
APPLIED MATERIALS INC0 citations50
US10802392B2Oct 13, 2020
Photomask laser etch
APPLIED MATERIALS INC0 citations50