Inventor
HSIEH PO-KUANG
TW18 patents
⚠️ This page may combine multiple inventors who share the name “HSIEH PO-KUANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNITED MICROELECTRONICS CORP
16 patentsUS12027600B2Jul 2, 2024
Nanowire transistor and method for fabricating the same
UNITED MICROELECTRONICS CORP1 citations73
US11227944B2Jan 18, 2022
HEMT and method of fabricating the same
UNITED MICROELECTRONICS CORP2 citations72
US10868148B2Dec 15, 2020
Rinse process after forming fin-shaped structure
UNITED MICROELECTRONICS CORP3 citations72
US10211313B2Feb 19, 2019
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP3 citations70
US12426385B2Sep 23, 2025
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US12302608B2May 13, 2025
Nanowire transistor and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US12114508B2Oct 8, 2024
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US11929431B2Mar 12, 2024
HEMT and method of fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US11705498B2Jul 18, 2023
Nanowire transistor and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US11670710B2Jun 6, 2023
HEMT and method of fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US11646367B2May 9, 2023
HEMT and method of fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US12501639B2Dec 16, 2025
Rinse process after forming fin-shaped structure
UNITED MICROELECTRONICS CORP0 citations61
US11735646B2Aug 22, 2023
Rinse process after forming fin-shaped structure
UNITED MICROELECTRONICS CORP0 citations61
US10431497B1Oct 1, 2019
Manufacturing method of epitaxial fin-shaped structure
UNITED MICROELECTRONICS CORP0 citations51
US10629695B2Apr 21, 2020
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations49
US10707135B2Jul 7, 2020
Method for fabricating semiconductor device
UNITED MICROELECTRONICS CORP0 citations37