Inventor
YAHIRO TAKEHISA
JP10 patents
⚠️ This page may combine multiple inventors who share the name “YAHIRO TAKEHISA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
9 patentsUS6204509B1Mar 20, 2001
Projection-microlithography apparatus, masks, and related methods incorporating reticle-distortion measurement and correction
NIKON CORP43 citations92
US6277532B1Aug 21, 2001
Charged-particle-beam microlithographic methods for correction of reticle distortions
NIKON CORP35 citations91
US6831282B2Dec 14, 2004
Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus
NIKON CORP7 citations72
US6635402B2Oct 21, 2003
Devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system
NIKON CORP11 citations72
US6521392B2Feb 18, 2003
Methods for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system
NIKON CORP10 citations72
US6218058B1Apr 17, 2001
Charged particle beam transfer mask
NIKON CORP3 citations62
US6861187B2Mar 1, 2005
Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system
NIKON CORP4 citations61
US6531786B1Mar 11, 2003
Durable reference marks for use in charged-particle-beam (CPB) microlithography, and CPB microlithography apparatus and methods comprising same
NIKON CORP3 citations61
US11276546B2Mar 15, 2022
Charged particle beam optical system, exposure apparatus, exposure method and device manufacturing method
NIKON CORP0 citations50