Inventor
FENG HANYING
US30 patents
⚠️ This page may combine multiple inventors who share the name “FENG HANYING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
14 patentsUS9009647B2Apr 14, 2015
Methods and systems for lithography calibration using a mathematical model for a lithographic process
ASML NETHERLANDS BV16 citations92
US7882480B2Feb 1, 2011
System and method for model-based sub-resolution assist feature generation
ASML NETHERLANDS BV37 citations92
US10310371B2Jun 4, 2019
Method and system for lithography process-window-maximizing optical proximity correction
ASML NETHERLANDS BV6 citations84
US9390206B2Jul 12, 2016
Methods and systems for lithography process window simulation
ASML NETHERLANDS BV7 citations84
US8806394B2Aug 12, 2014
Pattern-dependent proximity matching/tuning including light manipulation by projection optics
ASML NETHERLANDS BV9 citations84
US10846442B2Nov 24, 2020
Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration
ASML NETHERLANDS BV1 citations73
US10423075B2Sep 24, 2019
Methods and systems for pattern design with tailored response to wavefront aberration
ASML NETHERLANDS BV2 citations73
US10169522B2Jan 1, 2019
Methods and system for model-based generic matching and tuning
ASML NETHERLANDS BV1 citations73
US10025885B2Jul 17, 2018
Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration
ASML NETHERLANDS BV2 citations73
US9619603B2Apr 11, 2017
Optimization of source, mask and projection optics
ASML NETHERLANDS BV3 citations73
US9378309B2Jun 28, 2016
Pattern-independent and hybrid matching/tuning including light manipulation by projection optics
ASML NETHERLANDS BV4 citations73
US8893058B2Nov 18, 2014
Methods and system for model-based generic matching and tuning
ASML NETHERLANDS BV3 citations63
US10401732B2Sep 3, 2019
Optimization flows of source, mask and projection optics
ASML NETHERLANDS BV1 citations60
US9779186B2Oct 3, 2017
Methods for performing model-based lithography guided layout design
ASML NETHERLANDS BV1 citations52
YE JUN
7 patentsUS8200468B2Jun 12, 2012
Methods and system for lithography process window simulation
YE JUN147 citations99
US8542340B2Sep 24, 2013
Illumination optimization
YE JUN19 citations92
US9360766B2Jun 7, 2016
Method and system for lithography process-window-maximixing optical proximity correction
YE JUN12 citations84
US8930172B2Jan 6, 2015
Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration
YE JUN6 citations84
US8732625B2May 20, 2014
Methods for performing model-based lithography guided layout design
YE JUN14 citations84
US8418088B2Apr 9, 2013
Methods and system for lithography calibration
YE JUN9 citations84
US8527255B2Sep 3, 2013
Methods and systems for lithography process window simulation
YE JUN0 citations52
FENG HANYING
4 patentsUS8918742B2Dec 23, 2014
Methods and systems for pattern design with tailored response to wavefront aberration
FENG HANYING23 citations92
US8893060B2Nov 18, 2014
Optimization of source, mask and projection optics
FENG HANYING18 citations92
US8745551B2Jun 3, 2014
Pattern-independent and hybrid matching/tuning including light manipulation by projection optics
FENG HANYING11 citations83
US8560978B2Oct 15, 2013
Pattern-dependent proximity matching/tuning including light manipulation by projection optics
FENG HANYING15 citations83