P

Inventor

LEE YUNSEONG

KR52 patents

Patents

50 patents
US10714500B2Jul 14, 2020

Electronic device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD10 citations84
US11973142B2Apr 30, 2024

Integrated circuit including transistors and a method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD2 citations73
US11862705B2Jan 2, 2024

Electronic devices and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD2 citations73
US11711923B2Jul 25, 2023

Electronic device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD2 citations73
US11677025B2Jun 13, 2023

Electronic device including ferroelectric layer

SAMSUNG ELECTRONICS CO LTD1 citations73
US11527646B2Dec 13, 2022

Domain switching devices and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD4 citations73
US11522082B2Dec 6, 2022

Electronic device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD1 citations73
US11417763B2Aug 16, 2022

Integrated circuit including transistors and a method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD3 citations73
US11349026B2May 31, 2022

Electronic device including ferroelectric layer

SAMSUNG ELECTRONICS CO LTD3 citations73
US11177283B2Nov 16, 2021

Electronic device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD3 citations73
US10937885B2Mar 2, 2021

Electronic device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD2 citations73
US10702940B2Jul 7, 2020

Logic switching device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD1 citations73
US10808142B2Oct 20, 2020

Method of preparing graphene quantum dot, hardmask composition including the graphene quantum dot obtained by the method, method of forming patterns using the hardmask composition, and hardmask formed from the hardmask composition

SAMSUNG ELECTRONICS CO LTD2 citations72
US10551735B2Feb 4, 2020

Pellicle composition for photomask, pellicle for photomask formed from the pellicle composition, method of forming the pellicle, reticle including the pellicle, and exposure apparatus for lithography including the reticle

SAMSUNG ELECTRONICS CO LTD2 citations72
US12457792B2Oct 28, 2025

Thin film structure and electronic device including the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12382644B2Aug 5, 2025

Thin film structure including dielectric material layer and electronic device employing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12369361B2Jul 22, 2025

Integrated circuit including transistors and a method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12283629B2Apr 22, 2025

Ferroelectric thin-film structure and electronic device including the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12230711B2Feb 18, 2025

Electronic device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12224346B2Feb 11, 2025

Domain switching devices and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12206009B2Jan 21, 2025

Electronic devices and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12191311B2Jan 7, 2025

Semiconductor device including ferroelectric material, neuromorphic circuit including the semiconductor device, and neuromorphic computing apparatus including the neuromorphic circuit

SAMSUNG ELECTRONICS CO LTD0 citations62
US12176413B2Dec 24, 2024

Ferroelectric structure including a ferroelectric film having a first net polarization oriented toward a first polarization enhancement film and semiconductor device including the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12100749B2Sep 24, 2024

Ferroelectric thin-film structures, methods of manufacturing the same, and electronic devices including the ferroelectric thin-film structures

SAMSUNG ELECTRONICS CO LTD0 citations62
US12094971B2Sep 17, 2024

Electronic device including ferroelectric layer

SAMSUNG ELECTRONICS CO LTD0 citations62
US12089416B2Sep 10, 2024

Electronic device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12080595B2Sep 3, 2024

Method of forming interconnect structure

SAMSUNG ELECTRONICS CO LTD0 citations62
US12027589B2Jul 2, 2024

Semiconductor device including graphene and method of manufacturing the semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations62
US11908918B2Feb 20, 2024

Electronic device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11887989B2Jan 30, 2024

Semiconductor device including ferroelectric material, neuromorphic circuit including the semiconductor device, and neuromorphic computing apparatus including the neuromorphic circuit

SAMSUNG ELECTRONICS CO LTD0 citations62
US11824118B2Nov 21, 2023

Electronic device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11824119B2Nov 21, 2023

Domain switching devices and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11701728B2Jul 18, 2023

Logic switching device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11646375B2May 9, 2023

Ferroelectric thin-film structure and electronic device including the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11600712B2Mar 7, 2023

Ferroelectric structure including a ferroelectric film having a net polarization oriented to a polarization enhancement film and semiconductor device including the same

SAMSUNG ELECTRONICS CO LTD1 citations62
US11538918B2Dec 27, 2022

Electronic device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11527635B2Dec 13, 2022

Ferroelectric thin-film structures, methods of manufacturing the same, and electronic devices including the ferroelectric thin-film structures

SAMSUNG ELECTRONICS CO LTD1 citations62
US11456351B2Sep 27, 2022

Thin film structure including dielectric material layer and electronic device employing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11305365B2Apr 19, 2022

Logic switching device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US10777412B2Sep 15, 2020

Hardmask composition, method of preparing the same, and method of forming patterned layer by using the hardmask composition

SAMSUNG ELECTRONICS CO LTD1 citations62
US12484287B2Nov 25, 2025

Ferroelectric material, and electronic device including the same

SAMSUNG ELECTRONICS CO LTD0 citations61
US12218217B2Feb 4, 2025

Layer structure including dielectric layer, methods of manufacturing the layer structure, and electronic device including the layer structure

SAMSUNG ELECTRONICS CO LTD0 citations61
US11843037B2Dec 12, 2023

Semiconductor device and method of manufacturing the semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations61
US12527004B2Jan 13, 2026

Nonvolatile memory device and apparatus comprising the same

SAMSUNG ELECTRONICS CO LTD0 citations51
US12527038B2Jan 13, 2026

Electronic device including ferroelectric thin film structure

SAMSUNG ELECTRONICS CO LTD0 citations51
US12205951B2Jan 21, 2025

Complementary metal oxide semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations51
US11978798B2May 7, 2024

Semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations51
US11034847B2Jun 15, 2021

Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition

SAMSUNG ELECTRONICS CO LTD0 citations51
US9929238B2Mar 27, 2018

Graphene-containing device having graphene nanopatterns separated by narrow dead zone distance

SAMSUNG ELECTRONICS CO LTD1 citations51
US9748108B2Aug 29, 2017

Method of forming graphene nanopattern by using mask formed from block copolymer

SAMSUNG ELECTRONICS CO LTD1 citations51

Showing the top 50 of 52 patents by PatentIndex Score.