P

Inventor

WANG JEN-SHIANG

US22 patents
⚠️ This page may combine multiple inventors who share the name “WANG JEN-SHIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASML NETHERLANDS BV

20 patents
US9355200B2May 31, 2016

Method and apparatus for design of a metrology target

ASML NETHERLANDS BV16 citations90
US9903823B2Feb 27, 2018

Metrology method and apparatus

ASML NETHERLANDS BV10 citations83
US9804504B2Oct 31, 2017

Method and apparatus for design of a metrology target

ASML NETHERLANDS BV13 citations82
US9494874B2Nov 15, 2016

Method and apparatus for design of a metrology target

ASML NETHERLANDS BV5 citations70
US10691029B2Jun 23, 2020

Substrate measurement recipe configuration to improve device matching

ASML NETHERLANDS BV2 citations69
US10007744B2Jun 26, 2018

Process based metrology target design

ASML NETHERLANDS BV2 citations68
US10948831B2Mar 16, 2021

Methods of determining process models by machine learning

ASML NETHERLANDS BV1 citations62
US12182983B2Dec 31, 2024

Utilize machine learning in selecting high quality averaged SEM images from raw images automatically

ASML NETHERLANDS BV0 citations61
US11977336B2May 7, 2024

Method for improving a process for a patterning process

ASML NETHERLANDS BV0 citations61
US12468232B2Nov 11, 2025

Etch bias characterization and method of using the same

ASML NETHERLANDS BV0 citations59
US12204826B2Jan 21, 2025

Method and apparatus for inspection and metrology

ASML NETHERLANDS BV0 citations59
US11675274B2Jun 13, 2023

Etch bias characterization and method of using the same

ASML NETHERLANDS BV1 citations59
US11580274B2Feb 14, 2023

Method and apparatus for inspection and metrology

ASML NETHERLANDS BV1 citations59
US12529966B2Jan 20, 2026

Machine learning based image generation for model base alignments

ASML NETHERLANDS BV0 citations58
US11875101B2Jan 16, 2024

Method for patterning process modelling

ASML NETHERLANDS BV0 citations58
US10296681B2May 21, 2019

Process based metrology target design

ASML NETHERLANDS BV1 citations58
US11614690B2Mar 28, 2023

Methods of tuning process models

ASML NETHERLANDS BV1 citations55
US11567413B2Jan 31, 2023

Method for determining stochastic variation of printed patterns

ASML NETHERLANDS BV1 citations53
US10983440B2Apr 20, 2021

Selection of substrate measurement recipes

ASML NETHERLANDS BV0 citations49
US12505524B2Dec 23, 2025

Method for training or using a process model for determining a pattern in a patterning process

ASML NETHERLANDS BV0 citations48

UNIV LELAND STANFORD JUNIOR

1 patent

ENGELEN ADRIANUS FRANSISCUS PETRUS

1 patent