Inventor
RASTGAR NEEMA
US4 patents
Patents
4 patentsUS9620376B2Apr 11, 2017
Self limiting lateral atomic layer etch
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Self limiting lateral atomic layer etch
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US12322579B2Jun 3, 2025
Metal contamination reduction in substrate processing systems with transformer coupled plasma
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US11056321B2Jul 6, 2021
Metal contamination reduction in substrate processing systems with transformer coupled plasma
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