Inventor
YUN JONG WOOK
KR24 patents
⚠️ This page may combine multiple inventors who share the name “YUN JONG WOOK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SKC SOLMICS CO LTD
11 patentsUS11534888B2Dec 27, 2022
Polishing pad with improved fluidity of slurry and process for preparing same
SKC SOLMICS CO LTD2 citations71
US12076832B2Sep 3, 2024
Polishing pad with improved crosslinking density and process for preparing the same
SKC SOLMICS CO LTD0 citations61
US11548970B2Jan 10, 2023
Composition for a polishing pad, polishing pad, and process for preparing the same
SKC SOLMICS CO LTD0 citations61
US11400559B2Aug 2, 2022
Polishing pad, process for preparing the same, and process for preparing a semiconductor device using the same
SKC SOLMICS CO LTD0 citations61
US11279825B2Mar 22, 2022
Composition for polishing pad, polishing pad and preparation method thereof
SKC SOLMICS CO LTD1 citations61
US11207757B2Dec 28, 2021
Composition for polishing pad, polishing pad and preparation method of semiconductor device
SKC SOLMICS CO LTD1 citations61
US11267098B2Mar 8, 2022
Leakage-proof polishing pad and process for preparing the same
SKC SOLMICS CO LTD0 citations60
US11628535B2Apr 18, 2023
Polishing pad, method for manufacturing polishing pad, and polishing method applying polishing pad
SKC SOLMICS CO LTD0 citations50
US11571783B2Feb 7, 2023
Polishing pad having excellent airtightness
SKC SOLMICS CO LTD0 citations50
US11534887B2Dec 27, 2022
Polishing pad and method for preparing semiconductor device using same
SKC SOLMICS CO LTD0 citations50
US11000935B2May 11, 2021
Polishing pad that minimizes occurrence of defects and process for preparing the same
SKC SOLMICS CO LTD0 citations50
SK ENPULSE CO LTD
9 patentsUS11766759B2Sep 26, 2023
Porous polyurethane polishing pad and process for producing the same
SK ENPULSE CO LTD1 citations61
US12122013B2Oct 22, 2024
Composition for polishing pad and polishing pad
SK ENPULSE CO LTD0 citations59
US12521839B2Jan 13, 2026
Polishing pad and preparing method of semiconductor device using the same
SK ENPULSE CO LTD0 citations50
US12258460B2Mar 25, 2025
Polishing pad and method of fabricating semiconductor device using the same
SK ENPULSE CO LTD0 citations50
US12246408B2Mar 11, 2025
Polishing pad and method of fabricating semiconductor device using the same
SK ENPULSE CO LTD0 citations50
US12162114B2Dec 10, 2024
Polishing pad, manufacturing method thereof and preparing method of semiconductor device using the same
SK ENPULSE CO LTD0 citations50
US11951591B2Apr 9, 2024
Polishing pad, method for producing the same and method of fabricating semiconductor device using the same
SK ENPULSE CO LTD0 citations50
US11772236B2Oct 3, 2023
Porous polishing pad and process for producing the same all fees
SK ENPULSE CO LTD0 citations50
US12362232B2Jul 15, 2025
Polishing pad and method for preparing semiconductor device using the same
SK ENPULSE CO LTD0 citations48
ENPULSE CO LTD
3 patentsUS12515295B2Jan 6, 2026
Polishing pad and method for preparing a semiconductor device using the same
ENPULSE CO LTD1 citations58
US12515294B2Jan 6, 2026
Polishing pad with adjusted crosslinking degree and process for preparing the same
ENPULSE CO LTD0 citations48
US12479063B2Nov 25, 2025
Polishing pad, method for manufacturing polishing pad, and polishing method applying polishing pad
ENPULSE CO LTD0 citations48