Inventor
MURAYAMA HITOSHI
JP29 patents
Patents
29 patentsUS6861373B2Mar 1, 2005
Vacuum processing method and semiconductor device manufacturing method in which high-frequency powers having mutually different frequencies are applied to at least one electrode
CANON KK52 citations96
US6702898B2Mar 9, 2004
Deposited film forming apparatus
CANON KK43 citations96
US5455138AOct 3, 1995
Process for forming deposited film for light-receiving member, light-receiving member produced by the process, deposited film forming apparatus, and method for cleaning deposited film forming apparatus
CANON KK46 citations96
US6250251B1Jun 26, 2001
Vacuum processing apparatus and vacuum processing method
CANON KK49 citations92
US5817181AOct 6, 1998
Process for forming deposited film for light-receiving member, light-received member produced by the process deposited film forming apparatus, and method for cleaning deposited film forming apparatus
CANON KK39 citations92
US5392098AFeb 21, 1995
Electrophotographic apparatus with amorphous silicon-carbon photosensitive member driven relative to light source
CANON KK27 citations92
US6435130B1Aug 20, 2002
Plasma CVD apparatus and plasma processing method
CANON KK18 citations84
US6321759B1Nov 27, 2001
Method for cleaning a substrate
CANON KK15 citations84
US6849123B2Feb 1, 2005
Plasma processing method and method for manufacturing semiconductor device
CANON KK7 citations74
US6696108B2Feb 24, 2004
Vacuum processing method
CANON KK11 citations74
US6350497B1Feb 26, 2002
Plasma processing method
CANON KK8 citations74
US6300225B1Oct 9, 2001
Plasma processing method
CANON KK11 citations74
US6165274ADec 26, 2000
Plasma processing apparatus and method
CANON KK15 citations74
US6155201ADec 5, 2000
Plasma processing apparatus and plasma processing method
CANON KK13 citations74
US5631727AMay 20, 1997
Image forming apparatus having discharging means using light source actuated prior to latent image formation
CANON KK9 citations74
US5512510AApr 30, 1996
Method of manufacturing amorphous silicon electrophotographic photosensitive member
CANON KK11 citations74
US7051671B2May 30, 2006
Vacuum processing apparatus in which high frequency powers having mutually different frequencies are used to generate plasma for processing an article
CANON KK9 citations73
US6443191B1Sep 3, 2002
Vacuum processing methods
CANON KK9 citations73
US6946167B2Sep 20, 2005
Deposited film forming apparatus and deposited film forming method
CANON KK2 citations63
US6649020B1Nov 18, 2003
Plasma processing apparatus
CANON KK3 citations63
US6347601B1Feb 19, 2002
Film forming apparatus
CANON KK3 citations63
US6336423B1Jan 8, 2002
Apparatus for forming a deposited film by plasma chemical vapor deposition
CANON KK5 citations63
US6148763ANov 21, 2000
Deposited film forming apparatus
CANON KK6 citations63
US5516611AMay 14, 1996
Light-receiving member and methods of producing light-receiving member
CANON KK5 citations63
US7550180B2Jun 23, 2009
Plasma treatment method
CANON KK0 citations52
US6761128B2Jul 13, 2004
Plasma treatment apparatus
CANON KK0 citations52
US6486045B2Nov 26, 2002
Apparatus and method for forming deposited film
CANON KK1 citations52
US6413592B1Jul 2, 2002
Apparatus for forming a deposited film by plasma chemical vapor deposition
CANON KK0 citations52
US5766811AJun 16, 1998
Method of manufacturing amorphous silicon electrophotographic photosensitive member
CANON KK1 citations52