Inventor
TANIMOTO SAYAKA
US15 patents
⚠️ This page may combine multiple inventors who share the name “TANIMOTO SAYAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
11 patentsUS7880143B2Feb 1, 2011
Electron beam apparatus
HITACHI HIGH TECH CORP54 citations94
US7906761B2Mar 15, 2011
Charged particle beam apparatus
HITACHI HIGH TECH CORP16 citations92
US7378668B2May 27, 2008
Method and apparatus for applying charged particle beam
HITACHI HIGH TECH CORP25 citations92
US7060984B2Jun 13, 2006
Multi-charged beam lens and charged beam exposure apparatus using the same
HITACHI HIGH TECH CORP42 citations92
US7408760B2Aug 5, 2008
Charged particle beam application system
HITACHI HIGH TECH CORP21 citations91
US7655907B2Feb 2, 2010
Charged particle beam apparatus and pattern measuring method
HITACHI HIGH TECH CORP12 citations83
US10037866B2Jul 31, 2018
Charged particle beam apparatus
HITACHI HIGH TECH CORP5 citations73
US7679056B2Mar 16, 2010
Metrology system of fine pattern for process control by charged particle beam
HITACHI HIGH TECH CORP4 citations62
US7276709B2Oct 2, 2007
System and method for electron-beam lithography
HITACHI HIGH TECH CORP2 citations62
US9287082B2Mar 15, 2016
Charged particle beam apparatus
HITACHI HIGH TECH CORP0 citations52
US8026482B2Sep 27, 2011
Charged particle beam apparatus and control method therefor
HITACHI HIGH TECH CORP0 citations40
CANON KK
3 patentsUS7105842B2Sep 12, 2006
Method of charged particle beam lithography and equipment for charged particle beam lithography
CANON KK10 citations73
US7098464B2Aug 29, 2006
Electron beam writing equipment and electron beam writing method
CANON KK5 citations63
US6870310B2Mar 22, 2005
Multibeam generating apparatus and electron beam drawing apparatus
CANON KK5 citations62