Inventor
OUYANG HUI
TW42 patents
⚠️ This page may combine multiple inventors who share the name “OUYANG HUI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ORACLE INT CORP
11 patentsUS9467437B2Oct 11, 2016
Flexible authentication framework
ORACLE INT CORP26 citations98
US8352475B2Jan 8, 2013
Suggested content with attribute parameterization
ORACLE INT CORP49 citations98
US7941419B2May 10, 2011
Suggested content with attribute parameterization
ORACLE INT CORP69 citations98
US8725770B2May 13, 2014
Secure search performance improvement
ORACLE INT CORP44 citations93
US10382421B2Aug 13, 2019
Flexible framework for secure search
ORACLE INT CORP12 citations92
US9479494B2Oct 25, 2016
Flexible authentication framework
ORACLE INT CORP14 citations92
US7752221B2Jul 6, 2010
Progressive relaxation across tiers
ORACLE INT CORP32 citations92
US9853962B2Dec 26, 2017
Flexible authentication framework
ORACLE INT CORP7 citations84
US11038867B2Jun 15, 2021
Flexible framework for secure search
ORACLE INT CORP2 citations73
US10296361B2May 21, 2019
Chargeback system and method using chargeback data structures
ORACLE INT CORP1 citations51
US10606623B2Mar 31, 2020
Chargeback system and method using chargeback data structures
ORACLE INT CORP0 citations41
TAIWAN SEMICONDUCTOR MFG
8 patentsUS8900960B2Dec 2, 2014
Integrated circuit device with well controlled surface proximity and method of manufacturing same
TAIWAN SEMICONDUCTOR MFG6 citations84
US8367563B2Feb 5, 2013
Methods for a gate replacement process
TAIWAN SEMICONDUCTOR MFG5 citations84
US8357574B2Jan 22, 2013
Method of fabricating epitaxial structures
TAIWAN SEMICONDUCTOR MFG9 citations84
US7217663B2May 15, 2007
Via hole and trench structures and fabrication methods thereof and dual damascene structures and fabrication methods thereof
TAIWAN SEMICONDUCTOR MFG7 citations73
US8658525B2Feb 25, 2014
Methods for a gate replacement process
TAIWAN SEMICONDUCTOR MFG2 citations63
US9349831B2May 24, 2016
Integrated circuit device with well controlled surface proximity and method of manufacturing same
TAIWAN SEMICONDUCTOR MFG0 citations52
US9196491B2Nov 24, 2015
End-cut first approach for critical dimension control
TAIWAN SEMICONDUCTOR MFG0 citations51
US7436009B2Oct 14, 2008
Via structures and trench structures and dual damascene structures
TAIWAN SEMICONDUCTOR MFG0 citations51
TSAI MING-HUAN
4 patentsUS8236659B2Aug 7, 2012
Source and drain feature profile for improving device performance and method of manufacturing same
TSAI MING-HUAN41 citations97
US8216906B2Jul 10, 2012
Method of manufacturing integrated circuit device with well controlled surface proximity
TSAI MING-HUAN21 citations92
US8614132B2Dec 24, 2013
Integrated circuit device with well controlled surface proximity and method of manufacturing same
TSAI MING-HUAN10 citations84
US8445940B2May 21, 2013
Source and drain feature profile for improving device performance
TSAI MING-HUAN12 citations83
YEH MATT
4 patentsUS8415254B2Apr 9, 2013
Method for removing dummy poly in a gate last process
YEH MATT19 citations91
US8268085B2Sep 18, 2012
Methods for forming metal gate transistors
YEH MATT2 citations61
US8569185B2Oct 29, 2013
Method of fabricating gate electrode using a treated hard mask
YEH MATT0 citations51
US8173504B2May 8, 2012
Method of fabricating gate electrode using a treated hard mask
YEH MATT0 citations51
MEDIATEK INC
2 patentsUS10643370B2May 5, 2020
Method and apparatus for generating projection-based frame with 360-degree image content represented by triangular projection faces assembled in octahedron projection layout
MEDIATEK INC2 citations73
US10825229B2Nov 3, 2020
Method and apparatus for generating projection-based frame with 360-degree image content represented by triangular projection faces assembled in triangle-based projection layout
MEDIATEK INC0 citations52