Inventor
LIEN TA-CHENG
TW83 patents
⚠️ This page may combine multiple inventors who share the name “LIEN TA-CHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
48 patentsUS10534256B2Jan 14, 2020
Pellicle assembly and method for advanced lithography
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations83
US9759997B2Sep 12, 2017
Pellicle assembly and method for advanced lithography
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations82
US12153339B2Nov 26, 2024
Network type pellicle membrane and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations75
US12181797B2Dec 31, 2024
Extreme ultraviolet mask with alloy based absorbers
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12050399B2Jul 30, 2024
Pellicle assembly and method of making same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11561464B2Jan 24, 2023
EUV masks to prevent carbon contamination
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11237477B2Feb 1, 2022
Reticle container
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11106126B2Aug 31, 2021
Method of manufacturing EUV photo masks
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10036951B2Jul 31, 2018
Pellicle assembly and fabrication methods thereof
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11385538B2Jul 12, 2022
Cleaning method for photo masks and apparatus therefor
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11360384B2Jun 14, 2022
Method of fabricating and servicing a photomask
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US11294271B2Apr 5, 2022
Mask for extreme ultraviolet photolithography
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11294274B2Apr 5, 2022
Pellicle assembly and method for advanced lithography
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11204545B2Dec 21, 2021
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US9535317B2Jan 3, 2017
Treating a capping layer of a mask
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations71
US12153351B2Nov 26, 2024
Enhancing lithography operation for manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations70
US11829076B2Nov 28, 2023
Enhancing lithography operation for manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations70
US11550229B1Jan 10, 2023
Enhancing lithography operation for manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US11048158B2Jun 29, 2021
Method for extreme ultraviolet lithography mask treatment
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US12416853B2Sep 16, 2025
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12346019B2Jul 1, 2025
Reflective mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12153337B2Nov 26, 2024
Extreme ultraviolet mask with tantalum base alloy absorber
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12147154B2Nov 19, 2024
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12013630B2Jun 18, 2024
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11988953B2May 21, 2024
EUV masks to prevent carbon contamination
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11852965B2Dec 26, 2023
Extreme ultraviolet mask with tantalum base alloy absorber
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11829062B2Nov 28, 2023
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US11619875B2Apr 4, 2023
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US11506969B2Nov 22, 2022
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11221554B2Jan 11, 2022
EUV masks to prevent carbon contamination
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12578270B2Mar 17, 2026
Mask characterization methods
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12517423B2Jan 6, 2026
Extreme ultraviolet mask with alloy based absorbers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12487519B2Dec 2, 2025
Reticle container
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12366798B2Jul 22, 2025
Lithography mask and methods
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12346023B2Jul 1, 2025
Optical assembly with coating and methods of use
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12346020B2Jul 1, 2025
Optical assembly with coating and methods of use
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12346027B2Jul 1, 2025
Methods of making a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12339579B2Jun 24, 2025
Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12265322B2Apr 1, 2025
EUV mask blank and method of making EUV mask blank
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12259649B2Mar 25, 2025
Cleaning method for photo masks and apparatus therefor
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12169357B2Dec 17, 2024
Method of fabricating and servicing a photomask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12085843B2Sep 10, 2024
Method of manufacturing EUV photo masks
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12044960B2Jul 23, 2024
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12019367B2Jun 25, 2024
Mask blanks and methods for depositing layers on mask blank
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12001132B2Jun 4, 2024
Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11960201B2Apr 16, 2024
Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11899357B2Feb 13, 2024
Lithography mask
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11852969B2Dec 26, 2023
Cleaning method for photo masks and apparatus therefor
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
LEE HSIN-CHANG
2 patentsShowing the top 50 of 83 patents by PatentIndex Score.