Inventor

CHEN JENG-HORNG

TW136 patents

⚠️ This page may combine multiple inventors who share the name “CHEN JENG-HORNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHEN JENG-HORNG

TAIWAN SEMICONDUCTOR MFG CO LTD

Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity

Method of making an extreme ultraviolet pellicle

Lithography patterning with a gas phase resist

Method of patterning a material layer

EUV focus monitoring systems and methods

Extreme ultraviolet lithography collector contamination reduction

Lithography system with an embedded cleaning module

Mask cleaning

Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity

Pellicle assembly and method for advanced lithography

EUV lithography system and method with optimized throughput and stability

Pellicle assembly and method for advanced lithography

System and method for performing lithography process in semiconductor device fabrication

Method for integrated circuit patterning

Extreme ultraviolet lithography system, device, and method for printing low pattern density features

Particle removal system and method thereof

Pellicle for EUV mask and fabrication thereof

Extreme ultraviolet lithography process and mask

Method to mitigate defect printability for ID pattern

EUV mask and manufacturing method by using the same

TAIWAN SEMICONDUCTOR MFG

Method for integrated circuit patterning

Segmented box-in-box for improving back end overlay measurement

Pattern compensation for stitching

Method and system for E-beam lithography with multi-exposure

Method to define multiple layer patterns using a single exposure

Photoresist intensive patterning and processing

Using different transmittance with attenuate phase shift mask (APSM) to compensate ADI critical dimension proximity

Two-step photolithography method for aligning and patterning non-transparent layers

Smart subfield method for E-beam lithography

Electron beam data storage system and method for high volume manufacturing

Alignment method for used in chemical mechanical polishing process

Method to define multiple layer patterns with a single exposure by E-beam lithography

System and method for direct writing to a wafer

Method for monitoring alignment mark shielding

Method for lithography patterning

Method of etching a silicon containing layer using multilayer masks

Prevention of die loss to chemical mechanical polishing

Semiconductor wafer imaging mask having uniform pattern features and method of making same

Level adjustment systems and adjustable pin chuck thereof

Segmented box-in-box for improving back end overlay measurement

WANG HUNG-CHUN

Geometric pattern data quality verification for maskless lithography

Striping methodology for maskless lithography

Method for high volume e-beam lithography

Providing electron beam proximity effect correction by simulating write operations of polygonal shapes

Electron beam data storage system and method for high volume manufacturing

CHEN CHENG-HUNG

Data process for E-beam lithography

Efficient scan for E-beam lithography

CHEN PEI-SHIANG

Method and system for E-beam lithography with multi-exposure

Smart subfield method for E-beam lithography

WANG SHIH-CHI

Apparatus for charged particle lithography system