Inventor
SAPIENS NOAM
US45 patents
⚠️ This page may combine multiple inventors who share the name “SAPIENS NOAM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
25 patentsUS10072921B2Sep 11, 2018
Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element
KLA TENCOR CORP17 citations93
US9518916B1Dec 13, 2016
Compressive sensing for metrology
KLA TENCOR CORP38 citations93
US9739702B2Aug 22, 2017
Symmetric target design in scatterometry overlay metrology
KLA TENCOR CORP31 citations92
US10401738B2Sep 3, 2019
Overlay metrology using multiple parameter configurations
KLA TENCOR CORP14 citations86
US9816810B2Nov 14, 2017
Measurement of multiple patterning parameters
KLA TENCOR CORP11 citations84
US9784690B2Oct 10, 2017
Apparatus, techniques, and target designs for measuring semiconductor parameters
KLA TENCOR CORP14 citations84
US9490182B2Nov 8, 2016
Measurement of multiple patterning parameters
KLA TENCOR CORP12 citations84
US10101676B2Oct 16, 2018
Spectroscopic beam profile overlay metrology
KLA TENCOR CORP15 citations83
US10591406B2Mar 17, 2020
Symmetric target design in scatterometry overlay metrology
KLA TENCOR CORP6 citations82
US9581430B2Feb 28, 2017
Phase characterization of targets
KLA TENCOR CORP15 citations82
US10612916B2Apr 7, 2020
Measurement of multiple patterning parameters
KLA TENCOR CORP4 citations73
US10107765B2Oct 23, 2018
Apparatus, techniques, and target designs for measuring semiconductor parameters
KLA TENCOR CORP3 citations73
US9645079B2May 9, 2017
Structured illumination for contrast enhancement in overlay metrology
KLA TENCOR CORP2 citations73
US9546946B2Jan 17, 2017
Metrology target indentification, design and verification
KLA TENCOR CORP2 citations73
US10365211B2Jul 30, 2019
Systems and methods for metrology beam stabilization
KLA TENCOR CORP6 citations72
US10690602B2Jun 23, 2020
Methods and systems for measurement of thick films and high aspect ratio structures
KLA TENCOR CORP3 citations71
US10648796B2May 12, 2020
Optical metrology with small illumination spot size
KLA TENCOR CORP3 citations71
US10261014B2Apr 16, 2019
Near field metrology
KLA TENCOR CORP2 citations71
US9915524B2Mar 13, 2018
Optical metrology with small illumination spot size
KLA TENCOR CORP3 citations71
US9739719B2Aug 22, 2017
Measurement systems having linked field and pupil signal detection
KLA TENCOR CORP6 citations71
US10663392B2May 26, 2020
Variable aperture mask
KLA TENCOR CORP1 citations60
US10274425B2Apr 30, 2019
Structured illumination for contrast enhancement in overlay metrology
KLA TENCOR CORP0 citations52
US9255895B2Feb 9, 2016
Angle-resolved antisymmetric scatterometry
KLA TENCOR CORP0 citations52
US10234271B2Mar 19, 2019
Method and system for spectroscopic beam profile metrology including a detection of collected light according to wavelength along a third dimension of a hyperspectral detector
KLA TENCOR CORP0 citations51
US10062157B2Aug 28, 2018
Compressive sensing for metrology
KLA TENCOR CORP1 citations51
EYEQUE INC
9 patentsUS11707191B2Jul 25, 2023
Calibration and image procession methods and systems for obtaining accurate pupillary distance measurements
EYEQUE INC2 citations72
US10588507B2Mar 17, 2020
Optical method to assess the refractive properties of an optical system
EYEQUE INC2 citations71
USD986418SMay 16, 2023
Monocular optical device for automated refraction testing
EYEQUE INC3 citations68
US12364390B2Jul 22, 2025
Methods and systems for automatic measurements of optical systems
EYEQUE INC0 citations61
US12268447B2Apr 8, 2025
Means and methods of measuring refraction
EYEQUE INC0 citations61
US12114927B2Oct 15, 2024
Methods and apparatus for addressing presbyopia
EYEQUE INC0 citations61
US11503997B2Nov 22, 2022
Method and apparatus for measurement of a characteristic of an optical system
EYEQUE INC0 citations61
USD1008350SDec 19, 2023
Eyeglass frames for pupillary distance measurement
EYEQUE INC1 citations56
US11484196B2Nov 1, 2022
Method and apparatus for refraction and vision measurement
EYEQUE INC0 citations44