Inventor
WU ZHIQIANG
TW322 patents
⚠️ This page may combine multiple inventors who share the name “WU ZHIQIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
24 patentsUS6414376B1Jul 2, 2002
Method and apparatus for reducing isolation stress in integrated circuits
MICRON TECHNOLOGY INC212 citations99
US6309975B1Oct 30, 2001
Methods of making implanted structures
MICRON TECHNOLOGY INC83 citations99
US6261964B1Jul 17, 2001
Material removal method for forming a structure
MICRON TECHNOLOGY INC309 citations99
US6011307AJan 4, 2000
Anisotropic conductive interconnect material for electronic devices, method of use and resulting product
MICRON TECHNOLOGY INC155 citations99
US5939333AAug 17, 1999
Silicon nitride deposition method
MICRON TECHNOLOGY INC107 citations99
US5925918AJul 20, 1999
Gate stack with improved sidewall integrity
MICRON TECHNOLOGY INC136 citations99
US6245594B1Jun 12, 2001
Methods for forming conductive micro-bumps and recessed contacts for flip-chip technology and method of flip-chip assembly
MICRON TECHNOLOGY INC96 citations98
US6075274AJun 13, 2000
Semiconductor devices having gate stack with improved sidewall integrity
MICRON TECHNOLOGY INC91 citations98
US6599840B2Jul 29, 2003
Material removal method for forming a structure
MICRON TECHNOLOGY INC54 citations96
US6461967B2Oct 8, 2002
Material removal method for forming a structure
MICRON TECHNOLOGY INC44 citations96
US6127287AOct 3, 2000
Silicon nitride deposition method for use in forming a memory cell dielectric
MICRON TECHNOLOGY INC45 citations96
US6073497AJun 13, 2000
High resolution pressure sensing device having an insulating flexible matrix loaded with filler particles
MICRON TECHNOLOGY INC54 citations96
US6049101AApr 11, 2000
Processing methods of forming a capacitor, and capacitor construction
MICRON TECHNOLOGY INC41 citations96
US6025232AFeb 15, 2000
Methods of forming field effect transistors and related field effect transistor constructions
MICRON TECHNOLOGY INC38 citations96
US5998290ADec 7, 1999
Method to protect gate stack material during source/drain reoxidation
MICRON TECHNOLOGY INC84 citations96
US5786250AJul 28, 1998
Method of making a capacitor
MICRON TECHNOLOGY INC82 citations96
US6820502B2Nov 23, 2004
High resolution pressure-sensing device having an insulating flexible matrix loaded with filler particles
MICRON TECHNOLOGY INC17 citations93
US6607966B2Aug 19, 2003
Selective method to form roughened silicon
MICRON TECHNOLOGY INC17 citations93
US6051511AApr 18, 2000
Method and apparatus for reducing isolation stress in integrated circuits
MICRON TECHNOLOGY INC26 citations93
US6043119AMar 28, 2000
Method of making a capacitor
MICRON TECHNOLOGY INC19 citations93
US6027967AFeb 22, 2000
Method of making a fin-like stacked capacitor
MICRON TECHNOLOGY INC25 citations93
US6596648B2Jul 22, 2003
Material removal method for forming a structure
MICRON TECHNOLOGY INC27 citations92
US6596642B2Jul 22, 2003
Material removal method for forming a structure
MICRON TECHNOLOGY INC18 citations92
US6482691B2Nov 19, 2002
Seismic imaging using omni-azimuth seismic energy sources and directional sensing
MICRON TECHNOLOGY INC15 citations92
TAIWAN SEMICONDUCTOR MFG
11 patentsUS9006786B2Apr 14, 2015
Fin structure of semiconductor device
TAIWAN SEMICONDUCTOR MFG48 citations98
US8901607B2Dec 2, 2014
Semiconductor device and fabricating the same
TAIWAN SEMICONDUCTOR MFG60 citations98
US8633516B1Jan 21, 2014
Source/drain stack stressor for semiconductor device
TAIWAN SEMICONDUCTOR MFG200 citations98
US8815691B2Aug 26, 2014
Method of fabricating a gate all around device
TAIWAN SEMICONDUCTOR MFG37 citations94
US8614127B1Dec 24, 2013
Method of making a FinFET device
TAIWAN SEMICONDUCTOR MFG41 citations94
US9318606B2Apr 19, 2016
FinFET device and method of fabricating same
TAIWAN SEMICONDUCTOR MFG23 citations93
US9224736B1Dec 29, 2015
Structure and method for SRAM FinFET device
TAIWAN SEMICONDUCTOR MFG20 citations93
US9209185B2Dec 8, 2015
Method and structure for FinFET device
TAIWAN SEMICONDUCTOR MFG23 citations93
US9178067B1Nov 3, 2015
Structure and method for FinFET device
TAIWAN SEMICONDUCTOR MFG17 citations93
US9006842B2Apr 14, 2015
Tuning strain in semiconductor devices
TAIWAN SEMICONDUCTOR MFG26 citations93
US8765533B2Jul 1, 2014
Fin-like field effect transistor (FinFET) channel profile engineering method and associated device
TAIWAN SEMICONDUCTOR MFG21 citations92
TAIWAN SEMICONDUCTOR MFG CO LTD
5 patentsUS9412828B2Aug 9, 2016
Aligned gate-all-around structure
TAIWAN SEMICONDUCTOR MFG CO LTD749 citations99
US9853150B1Dec 26, 2017
Method of fabricating epitaxial gate dielectrics and semiconductor device of the same
TAIWAN SEMICONDUCTOR MFG CO LTD46 citations94
US9634127B2Apr 25, 2017
FinFET device and method for fabricating same
TAIWAN SEMICONDUCTOR MFG CO LTD16 citations93
US9559181B2Jan 31, 2017
Structure and method for FinFET device with buried sige oxide
TAIWAN SEMICONDUCTOR MFG CO LTD20 citations93
US9202917B2Dec 1, 2015
Buried SiGe oxide FinFET scheme for device enhancement
TAIWAN SEMICONDUCTOR MFG CO LTD25 citations93
TEXAS INSTRUMENTS INC
4 patentsUS6545903B1Apr 8, 2003
Self-aligned resistive plugs for forming memory cell with phase change material
TEXAS INSTRUMENTS INC470 citations99
US7189627B2Mar 13, 2007
Method to improve SRAM performance and stability
TEXAS INSTRUMENTS INC131 citations98
US7038258B2May 2, 2006
Semiconductor device having a localized halo implant therein and method of manufacture therefor
TEXAS INSTRUMENTS INC99 citations98
US6713360B2Mar 30, 2004
System for reducing segregation and diffusion of halo implants into highly doped regions
TEXAS INSTRUMENTS INC19 citations92
WU ZHIQIANG
2 patentsGOTO KEN-ICHI
1 patentWu wei-hao
1 patentSHENZHEN LINGKE TECH CO LTD
1 patent(unassigned)
1 patentShowing the top 50 of 322 patents by PatentIndex Score.