Inventor
HOFMANN RALF
DE46 patents
⚠️ This page may combine multiple inventors who share the name “HOFMANN RALF”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
31 patentsUS7244344B2Jul 17, 2007
Physical vapor deposition plasma reactor with VHF source power applied through the workpiece
APPLIED MATERIALS INC34 citations96
US6132566AOct 17, 2000
Apparatus and method for sputtering ionized material in a plasma
APPLIED MATERIALS INC80 citations96
US5902461AMay 11, 1999
Apparatus and method for enhancing uniformity of a metal film formed on a substrate with the aid of an inductively coupled plasma
APPLIED MATERIALS INC88 citations96
US5763851AJun 9, 1998
Slotted RF coil shield for plasma deposition system
APPLIED MATERIALS INC93 citations96
US9612522B2Apr 4, 2017
Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor
APPLIED MATERIALS INC36 citations93
US5876574AMar 2, 1999
Magnet design for a sputtering chamber
APPLIED MATERIALS INC31 citations93
US6146508ANov 14, 2000
Sputtering method and apparatus with small diameter RF coil
APPLIED MATERIALS INC16 citations84
US9354508B2May 31, 2016
Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor
APPLIED MATERIALS INC5 citations83
US9417515B2Aug 16, 2016
Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor
APPLIED MATERIALS INC8 citations82
US9739913B2Aug 22, 2017
Extreme ultraviolet capping layer and method of manufacturing and lithography thereof
APPLIED MATERIALS INC8 citations80
US7820020B2Oct 26, 2010
Apparatus for plasma-enhanced physical vapor deposition of copper with RF source power applied through the workpiece with a lighter-than-copper carrier gas
APPLIED MATERIALS INC4 citations74
US6409890B1Jun 25, 2002
Method and apparatus for forming a uniform layer on a workpiece during sputtering
APPLIED MATERIALS INC10 citations74
US11493841B2Nov 8, 2022
Glass ceramic for ultraviolet lithography and method of manufacturing thereof
APPLIED MATERIALS INC2 citations73
US9870935B2Jan 16, 2018
Monitoring system for deposition and method of operation thereof
APPLIED MATERIALS INC4 citations73
US9595436B2Mar 14, 2017
Growing graphene on substrates
APPLIED MATERIALS INC4 citations73
US9343347B2May 17, 2016
Portable electrostatic chuck carrier for thin substrates
APPLIED MATERIALS INC3 citations73
US10551732B2Feb 4, 2020
Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor
APPLIED MATERIALS INC1 citations72
US10236198B2Mar 19, 2019
Methods for the continuous processing of substrates
APPLIED MATERIALS INC2 citations72
US10209613B2Feb 19, 2019
System and method for manufacturing planarized extreme ultraviolet lithography blank
APPLIED MATERIALS INC2 citations72
US9612521B2Apr 4, 2017
Amorphous layer extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor
APPLIED MATERIALS INC2 citations72
US9581890B2Feb 28, 2017
Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereof
APPLIED MATERIALS INC3 citations72
US9581889B2Feb 28, 2017
Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor
APPLIED MATERIALS INC3 citations72
US10788744B2Sep 29, 2020
Extreme ultraviolet lithography mask blank manufacturing system and method of operation therefor
APPLIED MATERIALS INC0 citations52
US10551731B2Feb 4, 2020
Glass ceramic for ultraviolet lithography and method of manufacturing thereof
APPLIED MATERIALS INC0 citations52
US10522375B2Dec 31, 2019
Monitoring system for deposition and method of operation thereof
APPLIED MATERIALS INC0 citations52
US10199660B2Feb 5, 2019
Shadow mask alignment and management system
APPLIED MATERIALS INC0 citations52
US9905418B2Feb 27, 2018
Growing graphene on substrates
APPLIED MATERIALS INC0 citations52
US10197907B2Feb 5, 2019
Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor
APPLIED MATERIALS INC0 citations51
US10012908B2Jul 3, 2018
Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereof
APPLIED MATERIALS INC0 citations51
US10012897B2Jul 3, 2018
Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor
APPLIED MATERIALS INC0 citations51
US9690016B2Jun 27, 2017
Extreme ultraviolet reflective element with amorphous layers and method of manufacturing thereof
APPLIED MATERIALS INC0 citations51