Inventor

BARNES MICHAEL

US121 patents

⚠️ This page may combine multiple inventors who share the name “BARNES MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BARNES MICHAEL

APPLIED MATERIALS INC

Plasma processes for depositing low dielectric constant films

Ultrasonic spray coating of liquid precursor for low K dielectric coatings

Plasma processes for depositing low dielectric constant films

Plasma processes for depositing low dielectric constant films

Plasma reactor having a symmetric parallel conductor coil antenna

Plasma processes for depositing low dielectric constant films

Plasma processes for depositing low dielectric constant films

Capacitively coupled plasma reactor with magnetic plasma control

Plasma reactor having a symmetrical parallel conductor coil antenna

Plasma processes for depositing low dielectric constant films

Method for controlling etch uniformity

Method for cleaning a process chamber

Plasma processes for depositing low dielectric constant films

Inductively coupled plasma source with controllable power deposition

Plasma processes for depositing low dielectric constant films

Plasma reactor having a symmetrical parallel conductor coil antenna

Plasma reactor having a symmetric parallel conductor coil antenna

Atmospheric substrate processing apparatus for depositing multiple layers on a substrate

Plasma reactor having a symmetric parallel conductor coil antenna

Plasma processes for depositing low dielectric constant films

Plasma processes for depositing low dielectric constant films

Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber

Deposition of stable dielectric films

Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges

LAM RES CORP

Chamber liner for semiconductor process chambers

Method and apparatus for improving etch and deposition uniformity in plasma semiconductor processing

Gas injection system for plasma processing

Method for high density plasma chemical vapor deposition of dielectric films

Method and apparatus for abatement of reaction products from a vacuum processing chamber

Chamber liner for semiconductor process chambers

Rapid IR transmission thermometry for wafer temperature sensing

Plasma processor for large workpieces

NOVELLUS SYSTEMS INC

CVD flowable gap fill

Flowable film dielectric gap fill process

CVD flowable gap fill

Flowable film dielectric gap fill process

Flowable film dielectric gap fill process

(unassigned)

Capacitively coupled plasma reactor with magnetic plasma control

Plasma reactor electrode

Plasma reactor having a symmetric parallel conductor coil antenna

Monitoring dimensions of features at different locations in the processing of substrates

Elevator cable tensioning device and method

BARNES MICHAEL

Systems and methods for hyperspectral imaging

Hollow metal door

LAM RESEARCH

Variable high temperature chuck for high density plasma chemical vapor deposition

LANG CHI-I

CVD flowable gap fill

CAMCO DRILLING GROUP LTD

Rotary drill bit with hardfaced fluid passages and method of manufacturing

HYBRID SYSTEMS INC

Document sorting apparatus

VENTANA MED SYST INC

Methods, systems, and apparatuses for quantitative analysis of heterogeneous biomarker distribution

HARRIS CORP

Cellular mobile telephone system and method