Inventor
PARK JOO-HYEON
KR27 patents
⚠️ This page may combine multiple inventors who share the name “PARK JOO-HYEON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KOREA KUMHO PETROCHEM CO LTD
21 patentsUS6268106B1Jul 31, 2001
Chemically amplified positive photoresist composition
KOREA KUMHO PETROCHEM CO LTD25 citations92
US6146810ANov 14, 2000
Resist polymer and chemical amplified resist composition containing the same
KOREA KUMHO PETROCHEM CO LTD22 citations92
US6369143B1Apr 9, 2002
Polymer for radiation-sensitive resist and resist composition containing the same
KOREA KUMHO PETROCHEM CO LTD18 citations83
US6358666B1Mar 19, 2002
Chemically amplified resist composition containing norbornane type low molecular additive
KOREA KUMHO PETROCHEM CO LTD19 citations83
US5882835AMar 16, 1999
Positive photoresist resin and chemical amplified positive photoresist composition containing the same
KOREA KUMHO PETROCHEM CO LTD18 citations83
US5665841ASep 9, 1997
Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same
KOREA KUMHO PETROCHEM CO LTD15 citations82
US6313327B1Nov 6, 2001
Carboxylic acid derivatives and their synthesis method
KOREA KUMHO PETROCHEM CO LTD15 citations81
US6210859B1Apr 3, 2001
Copolymer for the manufacture of chemical amplified photoresist and a positive photoresist composition using the same
KOREA KUMHO PETROCHEM CO LTD17 citations80
US5962186AOct 5, 1999
Polymer for chemical amplified positive photoresist composition containing the same
KOREA KUMHO PETROCHEM CO LTD12 citations73
US5962185AOct 5, 1999
Polymer for positive photoresist and chemical amplified positive photoresist composition containing the same
KOREA KUMHO PETROCHEM CO LTD9 citations73
US5723258AMar 3, 1998
Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same
KOREA KUMHO PETROCHEM CO LTD8 citations73
US6641974B2Nov 4, 2003
Chemically amplified resist composition containing low molecular weight additives
KOREA KUMHO PETROCHEM CO LTD5 citations63
US5989775ANov 23, 1999
Copolymer useful for positive photoresist and chemical amplification positive photoresist composition comprising the same
KOREA KUMHO PETROCHEM CO LTD4 citations62
US5916995AJun 29, 1999
Acetal-substituted aromatic hydroxy compounds and negative photoresist compositions comprising the same
KOREA KUMHO PETROCHEM CO LTD6 citations62
US5677103AOct 14, 1997
Positive photoresist composition
KOREA KUMHO PETROCHEM CO LTD6 citations62
US7285373B2Oct 23, 2007
Polymer and chemically amplified resist composition containing the same
KOREA KUMHO PETROCHEM CO LTD6 citations59
US7326520B2Feb 5, 2008
Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same
KOREA KUMHO PETROCHEM CO LTD3 citations58
US5851728ADec 22, 1998
Three-component chemical amplified photoresist composition
KOREA KUMHO PETROCHEM CO LTD6 citations58
US7989257B2Aug 2, 2011
Polysilazane, method of synthesizing polysilazane, composition for manufacturing semiconductor device, and method of manufacturing semiconductor device using the composition
KOREA KUMHO PETROCHEM CO LTD1 citations52
US7939245B2May 10, 2011
Light absorbent and organic antireflection coating composition containing the same
KOREA KUMHO PETROCHEM CO LTD0 citations52
US6987198B2Jan 17, 2006
Acid generator and thin film composition containing the same
KOREA KUMHO PETROCHEM CO LTD0 citations45