Inventor
LUTZ TAREK
DE4 patents
Patents
4 patentsUS7087910B2Aug 8, 2006
Method for detecting and compensating for positional displacements in photolithographic mask units and apparatus for carrying out the method
INFINEON TECHNOLOGIES AG5 citations59
US6953644B2Oct 11, 2005
Method for compensating for scatter/reflection effects in particle beam lithography
INFINEON TECHNOLOGIES AG2 citations53
US7410732B2Aug 12, 2008
Process for producing a mask
INFINEON TECHNOLOGIES AG0 citations48
US7289231B2Oct 30, 2007
Apparatus and method for determining physical properties of a mask blank
INFINEON TECHNOLOGIES AG0 citations48