Inventor
SUZAKI KENICHI
JP30 patents
⚠️ This page may combine multiple inventors who share the name “SUZAKI KENICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
14 patentsUS9708708B2Jul 18, 2017
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC465 citations98
US9970112B2May 15, 2018
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC279 citations97
US11293096B2Apr 5, 2022
Substrate processing apparatus, method for manufacturing semiconductor device and vaporizer
HITACHI INT ELECTRIC INC8 citations85
US9093270B2Jul 28, 2015
Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC11 citations84
US6790793B2Sep 14, 2004
Method for manufacturing semiconductor device
HITACHI INT ELECTRIC INC13 citations84
US8999858B2Apr 7, 2015
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC7 citations82
USD828091SSep 11, 2018
Gas supply nozzle
HITACHI INT ELECTRIC INC8 citations80
US7737034B2Jun 15, 2010
Substrate treating apparatus and method for manufacturing semiconductor device
HITACHI INT ELECTRIC INC7 citations74
US7556839B2Jul 7, 2009
Method of manufacturing semiconductor device and apparatus for processing substrate
HITACHI INT ELECTRIC INC6 citations74
US6720274B2Apr 13, 2004
Method for fabricating a semiconductor device and a substrate processing apparatus
HITACHI INT ELECTRIC INC8 citations74
US7731797B2Jun 8, 2010
Substrate treating apparatus and semiconductor device manufacturing method
HITACHI INT ELECTRIC INC7 citations73
US11020760B2Jun 1, 2021
Substrate processing apparatus and precursor gas nozzle
HITACHI INT ELECTRIC INC3 citations69
US9390916B2Jul 12, 2016
Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC1 citations52
US7915165B2Mar 29, 2011
Substrate treating apparatus and method for manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations52
KOKUSAI ELECTRIC CORP
10 patentsUS10876207B2Dec 29, 2020
Substrate processing apparatus, liquid precursor replenishment system, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP3 citations72
US12234550B2Feb 25, 2025
Vaporizer, processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US11970771B2Apr 30, 2024
Vaporizer, substrate processing apparatus and method for manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US11873555B2Jan 16, 2024
Vaporizer, substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US12354868B2Jul 8, 2025
Cleaning method, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations56
US12354887B2Jul 8, 2025
Cleaning method, method of manufacturing semiconductor device, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations52
US11929272B2Mar 12, 2024
Substrate processing apparatus, substrate support, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations52
US12249502B2Mar 11, 2025
Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations49
US11866822B2Jan 9, 2024
Vaporizer, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations47
US12488999B2Dec 2, 2025
Substrate processing apparatus, cleaning method, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations45