Inventor
STIEPAN HANS-MICHAEL
DE12 patents
Patents
12 patentsUS10337850B2Jul 2, 2019
Interferometric measuring arrangement
ZEISS CARL SMT GMBH10 citations82
US11809085B2Nov 7, 2023
Mirror, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations72
US10502545B2Dec 10, 2019
Measuring method and measuring arrangement for an imaging optical system
ZEISS CARL SMT GMBH4 citations72
US10422718B2Sep 24, 2019
Test device and method for testing a mirror
ZEISS CARL SMT GMBH2 citations70
US12288706B2Apr 29, 2025
Parameterizing x-ray scattering measurement using slice-and-image tomographic imaging of semiconductor structures
ZEISS CARL SMT GMBH0 citations60
US12332043B2Jun 17, 2025
Measurement method for interferometrically determining a surface shape
ZEISS CARL SMT GMBH0 citations49
US12210289B2Jan 28, 2025
Mirror, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations49
US12405108B2Sep 2, 2025
Production method and measurement method
ZEISS CARL SMT GMBH0 citations48
US12235097B2Feb 25, 2025
Diffractive optical element for a test interferometer
ZEISS CARL SMT GMBH0 citations46
US12085780B2Sep 10, 2024
Optical system, heating arrangement, and method for heating an optical element in an optical system
ZEISS CARL SMT GMBH0 citations46
US12411417B2Sep 9, 2025
Projection objective including an optical device
ZEISS CARL SMT GMBH0 citations45
US10509330B2Dec 17, 2019
Method and device for characterizing a wafer patterned using at least one lithography step
ZEISS CARL SMT GMBH0 citations35