Inventor
CHA JI HOON
KR31 patents
⚠️ This page may combine multiple inventors who share the name “CHA JI HOON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
25 patentsUS9627514B1Apr 18, 2017
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD20 citations92
US9865597B2Jan 9, 2018
Semiconductor device having fin and dual liner
SAMSUNG ELECTRONICS CO LTD7 citations84
US9305825B2Apr 5, 2016
Methods of fabricating semiconductor devices including fin-shaped active regions
SAMSUNG ELECTRONICS CO LTD7 citations83
US7560386B2Jul 14, 2009
Method of manufacturing nonvolatile semiconductor memory device
SAMSUNG ELECTRONICS CO LTD12 citations80
US9136135B2Sep 15, 2015
Method of fabricating semiconductor device
SAMSUNG ELECTRONICS CO LTD4 citations73
US10090190B2Oct 2, 2018
Methods of fabricating semiconductor devices including fin-shaped active regions
SAMSUNG ELECTRONICS CO LTD2 citations72
US7745338B2Jun 29, 2010
Method of forming fine pitch hardmask patterns and method of forming fine patterns of semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD7 citations71
US7700496B2Apr 20, 2010
Transistor having a metal nitride layer pattern, etchant and methods of forming the same
SAMSUNG ELECTRONICS CO LTD2 citations63
US12362204B2Jul 15, 2025
Method of manufacturing semiconductor device using stationary laser module
SAMSUNG ELECTRONICS CO LTD0 citations62
US12042828B2Jul 23, 2024
Wafer cleaning apparatus and wafer cleaning method using the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11742221B2Aug 29, 2023
Dry cleaning apparatus and dry cleaning method
SAMSUNG ELECTRONICS CO LTD0 citations62
US11648594B2May 16, 2023
Wafer cleaning apparatus and wafer cleaning method using the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11631599B2Apr 18, 2023
Semiconductor device manufacturing apparatus including laser module
SAMSUNG ELECTRONICS CO LTD0 citations62
US11605545B2Mar 14, 2023
Wafer cleaning equipment
SAMSUNG ELECTRONICS CO LTD1 citations62
US11087996B2Aug 10, 2021
Dry cleaning apparatus and dry cleaning method
SAMSUNG ELECTRONICS CO LTD0 citations62
US8029688B2Oct 4, 2011
Method of fine patterning semiconductor device
SAMSUNG ELECTRONICS CO LTD2 citations62
US12100602B2Sep 24, 2024
Wet etching apparatus
SAMSUNG ELECTRONICS CO LTD0 citations52
US11721565B2Aug 8, 2023
Multi-chamber apparatus
SAMSUNG ELECTRONICS CO LTD0 citations51
US11189503B2Nov 30, 2021
Substrate drying method, photoresist developing method, photolithography method including the same, and substrate drying system
SAMSUNG ELECTRONICS CO LTD0 citations51
US10424503B2Sep 24, 2019
Methods of fabricating semiconductor devices including fin-shaped active regions
SAMSUNG ELECTRONICS CO LTD0 citations51
US9613811B2Apr 4, 2017
Methods of manufacturing semiconductor devices
SAMSUNG ELECTRONICS CO LTD1 citations51
US9040415B2May 26, 2015
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD1 citations51
US8349200B2Jan 8, 2013
Method of fine patterning semiconductor device
SAMSUNG ELECTRONICS CO LTD1 citations51
US12471323B2Nov 11, 2025
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations47
US9972683B2May 15, 2018
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations41