Inventor
KENNEDY WILLIAM S
US37 patents
⚠️ This page may combine multiple inventors who share the name “KENNEDY WILLIAM S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LAM RES CORP
22 patentsUS7858898B2Dec 28, 2010
Bevel etcher with gap control
LAM RES CORP349 citations99
US6394026B1May 28, 2002
Low contamination high density plasma etch chambers and methods for making the same
LAM RES CORP107 citations99
US6129808AOct 10, 2000
Low contamination high density plasma etch chambers and methods for making the same
LAM RES CORP215 citations99
US5863376AJan 26, 1999
Temperature controlling method and apparatus for a plasma processing chamber
LAM RES CORP281 citations99
US7645341B2Jan 12, 2010
Showerhead electrode assembly for plasma processing apparatuses
LAM RES CORP576 citations98
US6583064B2Jun 24, 2003
Low contamination high density plasma etch chambers and methods for making the same
LAM RES CORP89 citations98
US6376385B2Apr 23, 2002
Method of manufacturing assembly for plasma reaction chamber and use thereof
LAM RES CORP99 citations98
US6227140B1May 8, 2001
Semiconductor processing equipment having radiant heated ceramic liner
LAM RES CORP119 citations98
US6073577AJun 13, 2000
Electrode for plasma processes and method for manufacture and use thereof
LAM RES CORP242 citations98
US6408786B1Jun 25, 2002
Semiconductor processing equipment having tiled ceramic liner
LAM RES CORP97 citations97
US6194322B1Feb 27, 2001
Electrode for plasma processes and method for a manufacture and use thereof
LAM RES CORP89 citations97
US6063234AMay 16, 2000
Temperature sensing system for use in a radio frequency environment
LAM RES CORP289 citations97
US6148765ANov 21, 2000
Electrode for plasma processes and method for manufacture and use thereof
LAM RES CORP72 citations95
US7943007B2May 17, 2011
Configurable bevel etcher
LAM RES CORP24 citations92
US7861667B2Jan 4, 2011
Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode
LAM RES CORP23 citations92
US7543547B1Jun 9, 2009
Electrode assembly for plasma processing apparatus
LAM RES CORP39 citations92
US6306244B1Oct 23, 2001
Apparatus for reducing polymer deposition on substrate support
LAM RES CORP28 citations92
US6035868AMar 14, 2000
Method and apparatus for control of deposit build-up on an inner surface of a plasma processing chamber
LAM RES CORP21 citations92
US8721908B2May 13, 2014
Bevel etcher with vacuum chuck
LAM RES CORP9 citations84
US7827657B2Nov 9, 2010
Method of making an electrode assembly for plasma processing apparatus
LAM RES CORP11 citations84
US6155203ADec 5, 2000
Apparatus for control of deposit build-up on an inner surface of a plasma processing chamber
LAM RES CORP10 citations73
US9234775B2Jan 12, 2016
Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber
LAM RES CORP6 citations72
WESTERN ATLAS INT INC
3 patentsUS4834210AMay 30, 1989
Apparatus for generating seismic waves
WESTERN ATLAS INT INC29 citations93
US5438169AAug 1, 1995
Apparatus and method for determining the quality of clamping of a borehole seismic sensor system to the wall of a wellbore
WESTERN ATLAS INT INC30 citations92
US4941349AJul 17, 1990
Coaxial coiled-tubing cable head
WESTERN ATLAS INT INC37 citations92