Inventor
BAE SANG MAN
KR39 patents
⚠️ This page may combine multiple inventors who share the name “BAE SANG MAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HYUNDAI ELECTRONICS IND
27 patentsUS6015650AJan 18, 2000
Method for forming micro patterns of semiconductor devices
HYUNDAI ELECTRONICS IND63 citations96
US5830624ANov 3, 1998
Method for forming resist patterns comprising two photoresist layers and an intermediate layer
HYUNDAI ELECTRONICS IND42 citations93
US5925578AJul 20, 1999
Method for forming fine patterns of a semiconductor device
HYUNDAI ELECTRONICS IND25 citations92
US5811223ASep 22, 1998
Method for inspecting process defects occurring in semiconductor devices
HYUNDAI ELECTRONICS IND20 citations92
US5776640AJul 7, 1998
Photo mask for a process margin test and a method for performing a process margin test using the same
HYUNDAI ELECTRONICS IND21 citations92
US5741625AApr 21, 1998
Process for forming fine patterns in a semiconductor device utilizing multiple photosensitive film patterns and organic metal-coupled material
HYUNDAI ELECTRONICS IND32 citations92
US5716758AFeb 10, 1998
Process for forming fine pattern for semiconductor device utilizing multiple interlaced exposure masks
HYUNDAI ELECTRONICS IND36 citations92
US5698347ADec 16, 1997
Reticle for off-axis illumination
HYUNDAI ELECTRONICS IND20 citations92
US6569605B1May 27, 2003
Photomask and method for forming micro patterns of semiconductor device using the same
HYUNDAI ELECTRONICS IND16 citations84
US5902493AMay 11, 1999
Method for forming micro patterns of semiconductor devices
HYUNDAI ELECTRONICS IND20 citations84
US5721074AFeb 24, 1998
Method for fabricating a light exposure mask comprising the use of a process defect inspection system
HYUNDAI ELECTRONICS IND17 citations84
US5668042ASep 16, 1997
Method for aligning micro patterns of a semiconductor device
HYUNDAI ELECTRONICS IND18 citations84
US5989788ANov 23, 1999
Method for forming resist patterns having two photoresist layers and an intermediate layer
HYUNDAI ELECTRONICS IND13 citations74
US5882980AMar 16, 1999
Process of forming bipolar alignment mark for semiconductor
HYUNDAI ELECTRONICS IND9 citations74
US5870201AFeb 9, 1999
Magnification measuring mark
HYUNDAI ELECTRONICS IND9 citations74
US5821131AOct 13, 1998
Method for inspecting process defects occurring in semiconductor devices
HYUNDAI ELECTRONICS IND8 citations74
US5817445AOct 6, 1998
Method for inspecting process defects occurring in semiconductor devices
HYUNDAI ELECTRONICS IND8 citations74
US5705319AJan 6, 1998
Process for forming fine patterns for a semiconductor device utilizing three photosensitive layers
HYUNDAI ELECTRONICS IND7 citations73
US5675418AOct 7, 1997
Pattern alignment mark of semiconductor device
HYUNDAI ELECTRONICS IND7 citations73
US6329106B1Dec 11, 2001
Repair method for phase shift mask in semiconductor device
HYUNDAI ELECTRONICS IND9 citations70
US6821690B2Nov 23, 2004
Photomask and method for forming micro patterns of semiconductor device using the same
HYUNDAI ELECTRONICS IND3 citations63
US5905017AMay 18, 1999
Method for detecting microscopic differences in thickness of photoresist film coated on wafer
HYUNDAI ELECTRONICS IND3 citations63
US5902701AMay 11, 1999
Phase shift mask and method for fabricating the same
HYUNDAI ELECTRONICS IND4 citations63
US5849438ADec 15, 1998
Phase shift mask and method for fabricating the same
HYUNDAI ELECTRONICS IND4 citations63
US5834161ANov 10, 1998
Method for fabricating word lines of a semiconductor device
HYUNDAI ELECTRONICS IND4 citations63
US5705300AJan 6, 1998
Phase shift mask and method for fabricating the same
HYUNDAI ELECTRONICS IND4 citations63
US5698350ADec 16, 1997
Light exposure method for the fabrication of semiconductor devices
HYUNDAI ELECTRONICS IND3 citations63
HYNIX SEMICONDUCTOR INC
10 patentsUS7368226B2May 6, 2008
Method for forming fine patterns of semiconductor device
HYNIX SEMICONDUCTOR INC9 citations84
US6836322B2Dec 28, 2004
Particle inspection device and inspection method using the same
HYNIX SEMICONDUCTOR INC9 citations74
US7276410B2Oct 2, 2007
Semiconductor device with omega gate and method for fabricating a semiconductor device
HYNIX SEMICONDUCTOR INC3 citations63
US6864590B2Mar 8, 2005
Alignment mark for aligning wafer of semiconductor device
HYNIX SEMICONDUCTOR INC3 citations63
US8022409B2Sep 20, 2011
Semiconductor device with omega gate and method for fabricating a semiconductor device
HYNIX SEMICONDUCTOR INC1 citations52
US7755149B2Jul 13, 2010
Photo mask and semiconductor device fabricated using the same
HYNIX SEMICONDUCTOR INC0 citations52
US7736843B2Jun 15, 2010
Method for manufacturing a semiconductor device
HYNIX SEMICONDUCTOR INC0 citations52
US7709186B2May 4, 2010
Method for exposing photoresist film of semiconductor device
HYNIX SEMICONDUCTOR INC0 citations52
US7875515B2Jan 25, 2011
Method for manufacturing capacitor of semiconductor device
HYNIX SEMICONDUCTOR INC0 citations42
US8053312B2Nov 8, 2011
Semiconductor device and method for fabricating the same
HYNIX SEMICONDUCTOR INC0 citations31