Inventor
WRISTERS DERICK
US14 patents
Patents
14 patentsUS6093611AJul 25, 2000
Oxide liner for high reliability with reduced encroachment of the source/drain region
ADVANCED MICRO DEVICES INC294 citations99
US5939763AAug 17, 1999
Ultrathin oxynitride structure and process for VLSI applications
ADVANCED MICRO DEVICES INC263 citations97
US6245689B1Jun 12, 2001
Process for reliable ultrathin oxynitride formation
ADVANCED MICRO DEVICES INC107 citations96
US5943550AAug 24, 1999
Method of processing a semiconductor wafer for controlling drive current
ADVANCED MICRO DEVICES INC71 citations96
US6949436B2Sep 27, 2005
Composite spacer liner for improved transistor performance
ADVANCED MICRO DEVICES INC19 citations92
US6104077AAug 15, 2000
Semiconductor device having gate electrode with a sidewall air gap
ADVANCED MICRO DEVICES INC46 citations92
US6833307B1Dec 21, 2004
Method for manufacturing a semiconductor component having an early halo implant
ADVANCED MICRO DEVICES INC38 citations91
US5977600ANov 2, 1999
Formation of shortage protection region
ADVANCED MICRO DEVICES INC19 citations90
US6638829B1Oct 28, 2003
Semiconductor structure having a metal gate electrode and elevated salicided source/drain regions and a method for manufacture
ADVANCED MICRO DEVICES INC15 citations84
US6162694ADec 19, 2000
Method of forming a metal gate electrode using replaced polysilicon structure
ADVANCED MICRO DEVICES INC19 citations84
US7208383B1Apr 24, 2007
Method of manufacturing a semiconductor component
ADVANCED MICRO DEVICES INC19 citations83
US6159812ADec 12, 2000
Reduced boron diffusion by use of a pre-anneal
ADVANCED MICRO DEVICES INC16 citations82
US6674135B1Jan 6, 2004
Semiconductor structure having elevated salicided source/drain regions and metal gate electrode on nitride/oxide dielectric
ADVANCED MICRO DEVICES INC5 citations63
US6100148AAug 8, 2000
Semiconductor device having a liner defining the depth of an active region, and fabrication thereof
ADVANCED MICRO DEVICES INC3 citations63