Inventor
REYNOLDS GLYN
US7 patents
Patents
7 patentsUS6287435B1Sep 11, 2001
Method and apparatus for ionized physical vapor deposition
TOKYO ELECTRON LTD156 citations96
US6417626B1Jul 9, 2002
Immersed inductively—coupled plasma source
TOKYO ELECTRON LTD64 citations95
US6755945B2Jun 29, 2004
Ionized PVD with sequential deposition and etching
TOKYO ELECTRON LTD108 citations94
US6719886B2Apr 13, 2004
Method and apparatus for ionized physical vapor deposition
TOKYO ELECTRON LTD54 citations94
US6652711B2Nov 25, 2003
Inductively-coupled plasma processing system
TOKYO ELECTRON LTD31 citations91
US6692219B2Feb 17, 2004
Reduced edge contact wafer handling system and method of retrofitting and using same
TOKYO ELECTRON LTD46 citations87
US6156164ADec 5, 2000
Virtual shutter method and apparatus for preventing damage to gallium arsenide substrates during processing
TOKYO ELECTRON LTD15 citations69