Inventor
VUKOVIC MIRKO
US28 patents
⚠️ This page may combine multiple inventors who share the name “VUKOVIC MIRKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
25 patentsUS6287435B1Sep 11, 2001
Method and apparatus for ionized physical vapor deposition
TOKYO ELECTRON LTD156 citations96
US6417626B1Jul 9, 2002
Immersed inductively—coupled plasma source
TOKYO ELECTRON LTD64 citations95
US6719886B2Apr 13, 2004
Method and apparatus for ionized physical vapor deposition
TOKYO ELECTRON LTD54 citations94
US6254745B1Jul 3, 2001
Ionized physical vapor deposition method and apparatus with magnetic bucket and concentric plasma and material source
TOKYO ELECTRON LTD45 citations92
US6652711B2Nov 25, 2003
Inductively-coupled plasma processing system
TOKYO ELECTRON LTD31 citations91
US7691243B2Apr 6, 2010
Internal antennae for plasma processing with metal plasma
TOKYO ELECTRON LTD12 citations84
US7255774B2Aug 14, 2007
Process apparatus and method for improving plasma production of an inductively coupled plasma
TOKYO ELECTRON LTD13 citations83
US6771026B2Aug 3, 2004
Plasma generation by mode-conversion of RF-electromagnetic wave to electron cyclotron wave
TOKYO ELECTRON LTD8 citations73
US11049700B2Jun 29, 2021
Atmospheric plasma processing systems and methods for manufacture of microelectronic workpieces
TOKYO ELECTRON LTD2 citations69
US10215704B2Feb 26, 2019
Computed tomography using intersecting views of plasma using optical emission spectroscopy during plasma processing
TOKYO ELECTRON LTD2 citations68
US12105423B2Oct 1, 2024
Apparatus and methods for beam processing of substrates
TOKYO ELECTRON LTD0 citations62
US7959775B2Jun 14, 2011
Thermal stress-failure-resistant dielectric windows in vacuum processing systems
TOKYO ELECTRON LTD2 citations62
US7591232B2Sep 22, 2009
Internal coil with segmented shield and inductively-coupled plasma source and processing system therewith
TOKYO ELECTRON LTD5 citations62
US7537671B2May 26, 2009
Self-calibrating optical emission spectroscopy for plasma monitoring
TOKYO ELECTRON LTD3 citations62
US7084573B2Aug 1, 2006
Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
TOKYO ELECTRON LTD2 citations61
US8048226B2Nov 1, 2011
Method and system for improving deposition uniformity in a vapor deposition system
TOKYO ELECTRON LTD2 citations60
US7314537B2Jan 1, 2008
Method and apparatus for detecting a plasma
TOKYO ELECTRON LTD3 citations55
US6277250B1Aug 21, 2001
Dual cathode arrangement for physical vapor deposition of materials onto a round substrate with high aspect ratio features
TOKYO ELECTRON LTD5 citations54
US11883837B2Jan 30, 2024
System and method for liquid dispense and coverage control
TOKYO ELECTRON LTD0 citations52
US7315128B2Jan 1, 2008
Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
TOKYO ELECTRON LTD0 citations51
US12007689B2Jun 11, 2024
Apparatus and method for spin processing
TOKYO ELECTRON LTD0 citations48
US12462375B2Nov 4, 2025
Methods to automatically adjust one or more parameters of a camera system for optimal 3D reconstruction of features formed within/on a semiconductor substrate
TOKYO ELECTRON LTD0 citations41
US10522384B2Dec 31, 2019
Electromagnetic wave treatment of a substrate at microwave frequencies using a wave resonator
TOKYO ELECTRON LTD0 citations41
US10426001B2Sep 24, 2019
Processing system for electromagnetic wave treatment of a substrate at microwave frequencies
TOKYO ELECTRON LTD0 citations41
US10256121B2Apr 9, 2019
Heated stage with variable thermal emissivity method and apparatus
TOKYO ELECTRON LTD0 citations41