Inventor
MERREM HANS-JOACHIM
DE16 patents
⚠️ This page may combine multiple inventors who share the name “MERREM HANS-JOACHIM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOECHST AG
13 patentsUS4765844AAug 23, 1988
Solvents for photoresist removal
HOECHST AG58 citations94
US5340682AAug 23, 1994
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound
HOECHST AG29 citations92
US5338641AAug 16, 1994
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound
HOECHST AG39 citations92
US4927732AMay 22, 1990
Positive-working photosensitive composition containing a dye and positive-working photosensitive recording material prepared therefrom
HOECHST AG20 citations81
US5326826AJul 5, 1994
Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation
HOECHST AG16 citations74
US5198322AMar 30, 1993
Positively operating radiation-sensitive mixture containing a polyfunctional α-diazo-β-keto ester and radiation-sensitive recording material containing this mixture
HOECHST AG10 citations73
US4996301AFeb 26, 1991
Polyfunctional α-diazo-β-keto esters and their use in light-sensitive compositions
HOECHST AG10 citations73
US4842901AJun 27, 1989
Coating solution and process for producing glassy layers
HOECHST AG14 citations73
US5302488AApr 12, 1994
Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material
HOECHST AG6 citations63
US5256517AOct 26, 1993
Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having α-β-keto ester units and sulfonate units
HOECHST AG6 citations63
US5191069AMar 2, 1993
Polyfunctional compounds containing α-diazo-β-keto ester units and sulfonate units
HOECHST AG5 citations63
US5066567ANov 19, 1991
Image reversal process utilizing a positive-working photosensitive composition containing a dye
HOECHST AG3 citations62
US5358823AOct 25, 1994
Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone
HOECHST AG1 citations51
MERCK PATENT GMBH
3 patentsUS4540650ASep 10, 1985
Photoresists suitable for forming relief structures of highly heat-resistant polymers
MERCK PATENT GMBH29 citations90
US4576903AMar 18, 1986
Developer for positive photoresists
MERCK PATENT GMBH33 citations86
US4539288ASep 3, 1985
Process for the development of relief structures based on radiation-crosslinked polymeric precursors of polymers which are resistant to high temperature
MERCK PATENT GMBH5 citations60