Inventor
NEISIUS KARL H
DE3 patents
Patents
3 patentsUS4540650ASep 10, 1985
Photoresists suitable for forming relief structures of highly heat-resistant polymers
MERCK PATENT GMBH29 citations90
US4786578ANov 22, 1988
Agent and method for the removal of photoresist and stripper residues from semiconductor substrates
MERCK PATENT GMBH79 citations89
US4762767AAug 9, 1988
Negatively operating photoresist composition, with radiation-absorbing additives
MERCK PATENT GMBH12 citations70