Inventor
HASEBE KEIZO
JP11 patents
Patents
11 patentsUS5826129AOct 20, 1998
Substrate processing system
TOKYO ELECTRON LTD552 citations99
US6033475AMar 7, 2000
Resist processing apparatus
TOKYO ELECTRON LTD90 citations97
US5658615AAug 19, 1997
Method of forming coating film and apparatus therefor
TOKYO ELECTRON LTD187 citations97
US6063190AMay 16, 2000
Method of forming coating film and apparatus therefor
TOKYO ELECTRON LTD94 citations96
US5942035AAug 24, 1999
Solvent and resist spin coating apparatus
TOKYO ELECTRON LTD103 citations96
US5374312ADec 20, 1994
Liquid coating system
TOKYO ELECTRON LTD119 citations96
US5252137AOct 12, 1993
System and method for applying a liquid
TOKYO ELECTRON LTD77 citations96
US6551400B2Apr 22, 2003
Coating apparatus
TOKYO ELECTRON LTD21 citations92
US6503003B2Jan 7, 2003
Film forming method and film forming apparatus
TOKYO ELECTRON LTD19 citations92
US6228561B1May 8, 2001
Film forming method and film forming apparatus
TOKYO ELECTRON LTD36 citations92
US5866307AFeb 2, 1999
Resist processing method and resist processing system
TOKYO ELECTRON LTD34 citations91