Inventor

SIM JAE HWANG

KR61 patents

⚠️ This page may combine multiple inventors who share the name “SIM JAE HWANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SIM JAE HWANG

SAMSUNG ELECTRONICS CO LTD

Methods of forming semiconductor devices having narrow conductive line patterns

Semiconductor devices having a convex active region and methods of forming the same

Semiconductor memory devices and methods of fabricating the same

Semiconductor devices including patterns

Semiconductor device and method of manufacturing the same

Methods of forming non-volatile memory devices having air gaps

Semiconductor device and methods of manufacturing the same

Methods of fabricating semiconductor devices using double patterning technology

Semiconductor device and method of manufacturing the same

Method of forming patterns for semiconductor device

Integrated circuit device and method of manufacturing the same

Methods of fabricating semiconductor devices including multiple patterning

String floating gates with air gaps in between

Method of forming minute patterns in semiconductor device using double patterning

Semiconductor devices having fine patterns

Method of manufacturing semiconductor device

Nonvolatile memory device and method of manufacturing the same

Methods of forming a semiconductor device

Method of fabricating semiconductor device having fine contact holes

Method of forming semiconductor device

Methods for fabricating a semiconductor device and semiconductor devices fabricated by the same

Methods of fabricating semiconductor devices and devices fabricated thereby

Semiconductor device and method of fabricating the same

Semiconductor memory devices

Semiconductor memory devices

Pattern structure and method of forming the same

Method of fabricating semiconductor devices

Semiconductor device and method of manufacturing the same

SIM JAE-HWANG

Semiconductor memory devices including an air gap and methods of fabricating the same

Method of forming fine patterns of semiconductor device

Method of manufacturing string floating gates with air gaps in between

Microelectronic fabrication methods using composite layers for double patterning

Non-volatile memory devices including gates having reduced widths and protection spacers and methods of manufacturing the same

Method of fabricating semiconductor device

Method of manufacturing nonvolatile memory device

Semiconductor device and method of manufacturing the same

LEE YOUNG-HO

Methods of forming fine patterns in integrated circuit devices

Methods of forming fine patterns in integrated circuit devices

Method of forming patterns for semiconductor device

Method of forming patterns for semiconductor device

Methods of forming semiconductor device patterns

Method of forming active region structure

PARK SANG-YONG

Methods of forming fine patterns in the fabrication of semiconductor devices

Methods of forming fine patterns in the fabrication of semiconductor devices

Method of forming minute patterns in semiconductor device using double patterning

KIM DONG-WON

Semiconductor devices having dual trench, methods of fabricating the same, and electronic system having the same

Semiconductor devices having dual trench, methods of fabricating the same, and electronic system having the same

PARK YOUNG-JU

Semiconductor devices having narrow conductive line patterns and related methods of forming such semiconductor devices

PARK YOONMOON

Semiconductor device with dummy contacts

KIM TAE-HYUN

Methods of manufacturing semiconductor devices