P

Inventor

SRINIVASAN SUNIL

US25 patents
⚠️ This page may combine multiple inventors who share the name “SRINIVASAN SUNIL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

22 patents
US10791617B2Sep 29, 2020

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

APPLIED MATERIALS INC62 citations98
US10555412B2Feb 4, 2020

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

APPLIED MATERIALS INC67 citations98
US10448494B1Oct 15, 2019

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

APPLIED MATERIALS INC68 citations98
US10448495B1Oct 15, 2019

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

APPLIED MATERIALS INC63 citations98
US9947517B1Apr 17, 2018

Adjustable extended electrode for edge uniformity control

APPLIED MATERIALS INC48 citations98
USD797691SSep 19, 2017

Composite edge ring

APPLIED MATERIALS INC59 citations97
US11284500B2Mar 22, 2022

Method of controlling ion energy distribution using a pulse generator

APPLIED MATERIALS INC21 citations94
US10504702B2Dec 10, 2019

Adjustable extended electrode for edge uniformity control

APPLIED MATERIALS INC14 citations94
US10103010B2Oct 16, 2018

Adjustable extended electrode for edge uniformity control

APPLIED MATERIALS INC34 citations94
US10991556B2Apr 27, 2021

Adjustable extended electrode for edge uniformity control

APPLIED MATERIALS INC11 citations86
US10553404B2Feb 4, 2020

Adjustable extended electrode for edge uniformity control

APPLIED MATERIALS INC13 citations86
US11393710B2Jul 19, 2022

Wafer edge ring lifting solution

APPLIED MATERIALS INC9 citations85
US11087989B1Aug 10, 2021

Cryogenic atomic layer etch with noble gases

APPLIED MATERIALS INC8 citations83
US11515166B2Nov 29, 2022

Cryogenic atomic layer etch with noble gases

APPLIED MATERIALS INC2 citations72
US12094752B2Sep 17, 2024

Wafer edge ring lifting solution

APPLIED MATERIALS INC1 citations62
US11996294B2May 28, 2024

Cryogenic atomic layer etch with noble gases

APPLIED MATERIALS INC0 citations62
US12255055B2Mar 18, 2025

Integrated cleaning process for substrate etching

APPLIED MATERIALS INC0 citations61
US11521838B2Dec 6, 2022

Integrated cleaning process for substrate etching

APPLIED MATERIALS INC0 citations61
US11521849B2Dec 6, 2022

In-situ deposition process

APPLIED MATERIALS INC0 citations60
US11049760B2Jun 29, 2021

Universal process kit

APPLIED MATERIALS INC0 citations52
US12456611B2Oct 28, 2025

Systems and methods for controlling a voltage waveform at a substrate during plasma processing

APPLIED MATERIALS INC0 citations51
US12237149B2Feb 25, 2025

Reducing aspect ratio dependent etch with direct current bias pulsing

APPLIED MATERIALS INC0 citations43

SASANO HIROKI

1 patent

SRINIVASAN SUNIL

1 patent

PLUMHOFF JASON

1 patent