Inventor
LI JIANHENG
US28 patents
⚠️ This page may combine multiple inventors who share the name “LI JIANHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
VERSUM MAT US LLC
16 patentsUS10468244B2Nov 5, 2019
Precursors and flowable CVD methods for making low-K films to fill surface features
VERSUM MAT US LLC388 citations99
US10145008B2Dec 4, 2018
Compositions and methods using same for carbon doped silicon containing films
VERSUM MAT US LLC8 citations84
US10395920B2Aug 27, 2019
Alkyl-alkoxysilacyclic compounds
VERSUM MAT US LLC2 citations72
US11268190B2Mar 8, 2022
Processes for depositing silicon-containing films using halidosilane compounds
VERSUM MAT US LLC2 citations71
US10106890B2Oct 23, 2018
Compositions and methods using same for deposition of silicon-containing film
VERSUM MAT US LLC3 citations71
US12505999B2Dec 23, 2025
Precursors and flowable CVD methods for making low-K films to fill surface features
VERSUM MAT US LLC0 citations62
US11732351B2Aug 22, 2023
Methods for depositing a conformal metal or metalloid silicon nitride film and resultant films
VERSUM MAT US LLC0 citations62
US11270880B2Mar 8, 2022
Precursors and flowable CVD methods for making low-k films to fill surface features
VERSUM MAT US LLC0 citations62
US11142658B2Oct 12, 2021
Bisaminoalkoxysilane compounds and methods for using same to deposit silicon-containing films
VERSUM MAT US LLC0 citations62
US11104990B2Aug 31, 2021
Methods for depositing a conformal metal or metalloid silicon nitride film and resultant films
VERSUM MAT US LLC0 citations62
US10985013B2Apr 20, 2021
Method and precursors for manufacturing 3D devices
VERSUM MAT US LLC0 citations61
US11913112B2Feb 27, 2024
Processes for depositing silicon-containing films using halidosilane compounds and compositions
VERSUM MAT US LLC0 citations60
US11017998B2May 25, 2021
Precursors and flowable CVD methods for making low-K films to fill surface features
VERSUM MAT US LLC0 citations52
US12454753B2Oct 28, 2025
Compositions and methods using same for deposition of silicon-containing film
VERSUM MAT US LLC0 citations51
US12428722B2Sep 30, 2025
Compositions and methods using same for deposition of silicon-containing film
VERSUM MAT US LLC0 citations51
US12312684B2May 27, 2025
Siloxane compositions and methods for using the compositions to deposit silicon containing films
VERSUM MAT US LLC0 citations50
APPLIED MATERIALS INC
6 patentsUS12021152B2Jun 25, 2024
Process to reduce plasma induced damage
APPLIED MATERIALS INC0 citations62
US11670722B2Jun 6, 2023
Process to reduce plasma induced damage
APPLIED MATERIALS INC0 citations62
US11380801B2Jul 5, 2022
Process to reduce plasma induced damage
APPLIED MATERIALS INC0 citations62
US10748759B2Aug 18, 2020
Methods for improved silicon nitride passivation films
APPLIED MATERIALS INC0 citations52
US10923327B2Feb 16, 2021
Chamber liner
APPLIED MATERIALS INC0 citations51
US10804408B2Oct 13, 2020
Process to reduce plasma induced damage
APPLIED MATERIALS INC0 citations51
AIR PROD & CHEM
5 patentsUS10421766B2Sep 24, 2019
Bisaminoalkoxysilane compounds and methods for using same to deposit silicon-containing films
AIR PROD & CHEM5 citations84
US9243324B2Jan 26, 2016
Methods of forming non-oxygen containing silicon-based films
AIR PROD & CHEM17 citations84
US9922818B2Mar 20, 2018
Alkyl-alkoxysilacyclic compounds
AIR PROD & CHEM8 citations83
US10354860B2Jul 16, 2019
Method and precursors for manufacturing 3D devices
AIR PROD & CHEM5 citations73
US10319862B2Jun 11, 2019
Barrier materials for display devices
AIR PROD & CHEM6 citations71