Inventor
MINEGISHI SHINYA
JP20 patents
⚠️ This page may combine multiple inventors who share the name “MINEGISHI SHINYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
19 patentsUS11079676B2Aug 3, 2021
Radiation-sensitive composition, pattern-forming method, and metal-containing resin and production method thereof
JSR CORP8 citations83
US11506976B2Nov 22, 2022
Radiation-sensitive composition and resist pattern-forming method
JSR CORP2 citations72
US9587065B2Mar 7, 2017
Composition for pattern formation, and pattern-forming method
JSR CORP2 citations72
US10308752B2Jun 4, 2019
Block copolymer
JSR CORP1 citations71
US9684235B2Jun 20, 2017
Directed self-assembling composition for pattern formation, and pattern-forming method
JSR CORP2 citations71
US9594303B2Mar 14, 2017
Resist pattern-forming method and photoresist composition
JSR CORP4 citations71
US9607849B2Mar 28, 2017
Pattern-forming method and resist underlayer film-forming composition
JSR CORP2 citations70
US10995173B2May 4, 2021
Composition and pattern-forming method
JSR CORP0 citations60
US9268225B2Feb 23, 2016
Composition, resist pattern-forming method, compound, method for production of compound, and polymer
JSR CORP2 citations60
US10146130B2Dec 4, 2018
Composition for base, and directed self-assembly lithography method
JSR CORP0 citations51
US9690192B2Jun 27, 2017
Composition for base, and directed self-assembly lithography method
JSR CORP0 citations51
US9599892B2Mar 21, 2017
Composition for pattern formation, and pattern-forming method
JSR CORP0 citations51
US9718950B2Aug 1, 2017
Directed self-assembly composition for pattern formation and pattern-forming method
JSR CORP1 citations49
US9046769B2Jun 2, 2015
Pattern-forming method, and composition for forming resist underlayer film
JSR CORP0 citations49
US8956807B2Feb 17, 2015
Method for forming resist pattern, and composition for forming resist underlayer film
JSR CORP0 citations47
US9534135B2Jan 3, 2017
Composition for pattern formation, and pattern-forming method
JSR CORP0 citations41
US9557644B2Jan 31, 2017
Base film-forming composition, and directed self-assembly lithography method
JSR CORP0 citations40
US9487868B2Nov 8, 2016
Pattern-forming method
JSR CORP0 citations40
US9046775B2Jun 2, 2015
Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound
JSR CORP0 citations39