Inventor
IGUCHI HIROYUKI
JP19 patents
⚠️ This page may combine multiple inventors who share the name “IGUCHI HIROYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
12 patentsUS10556993B2Feb 11, 2020
Addition-curable organopolysiloxane resin composition, cured product thereof, and semiconductor device having the cured product
SHINETSU CHEMICAL CO2 citations71
US12521919B2Jan 13, 2026
Anisotropic film and method for manufacturing anisotropic film
SHINETSU CHEMICAL CO0 citations62
US10253139B2Apr 9, 2019
Addition-curable silicone resin composition and a semiconductor device
SHINETSU CHEMICAL CO1 citations61
US10818618B2Oct 27, 2020
Adhesive substrate, transfer device having adhesive substrate, and method for producing adhesive substrate
SHINETSU CHEMICAL CO0 citations52
US12146057B2Nov 19, 2024
Cyclic imide resin composition, prepreg, copper-clad laminate and printed-wiring board
SHINETSU CHEMICAL CO0 citations51
US11326056B2May 10, 2022
Radiation curable organosilicon resin composition
SHINETSU CHEMICAL CO0 citations51
US10696794B2Jun 30, 2020
Addition-curable silicone resin composition and a semiconductor device
SHINETSU CHEMICAL CO0 citations51
US9859474B2Jan 2, 2018
Addition curable organopolysiloxane composition, and semiconductor package
SHINETSU CHEMICAL CO0 citations51
US10040924B2Aug 7, 2018
Adhesion promoter, addition curable organopolysiloxane resin composition and semiconductor apparatus
SHINETSU CHEMICAL CO1 citations50
US11530324B2Dec 20, 2022
Slurry composition, cured product of the slurry composition, and substrate, film and prepreg using the cured product
SHINETSU CHEMICAL CO0 citations48
US12421435B2Sep 23, 2025
Adhesive composition for flexible printed-wiring board (FPC), and heat-curable resin film, prepreg and FPC substrate containing same
SHINETSU CHEMICAL CO0 citations47
US11608438B2Mar 21, 2023
Low-dielectric heat dissipation film composition and low-dielectric heat dissipation film
SHINETSU CHEMICAL CO0 citations47
HODOGAYA CHEMICAL CO LTD
5 patentsUS4878942ANov 7, 1989
Benzamide derivative, process for its production and plant growth regulant
HODOGAYA CHEMICAL CO LTD57 citations92
US5043006AAug 27, 1991
Benzamide derivatives and plant growth regulants containing them
HODOGAYA CHEMICAL CO LTD2 citations61
US4902815AFeb 20, 1990
Plant growth regulant
HODOGAYA CHEMICAL CO LTD4 citations58
US5227511AJul 13, 1993
Benzamide derivatives and plant growth regulants containing them
HODOGAYA CHEMICAL CO LTD1 citations50
US4976768ADec 11, 1990
Plant growth regulant
HODOGAYA CHEMICAL CO LTD0 citations48