Inventor
MICHAELIS ALEXANDER
US20 patents
⚠️ This page may combine multiple inventors who share the name “MICHAELIS ALEXANDER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
12 patentsUS6740555B1May 25, 2004
Semiconductor structures and manufacturing methods
INFINEON TECHNOLOGIES AG16 citations92
US6555862B1Apr 29, 2003
Self-aligned buried strap for vertical transistors
INFINEON TECHNOLOGIES AG29 citations92
US6426253B1Jul 30, 2002
Method of forming a vertically oriented device in an integrated circuit
INFINEON TECHNOLOGIES AG49 citations92
US6335247B1Jan 1, 2002
Integrated circuit vertical trench device and method of forming thereof
INFINEON TECHNOLOGIES AG25 citations92
US6426254B2Jul 30, 2002
Method for expanding trenches by an anisotropic wet etch
INFINEON TECHNOLOGIES AG31 citations88
US6486024B1Nov 26, 2002
Integrated circuit trench device with a dielectric collar stack, and method of forming thereof
INFINEON TECHNOLOGIES AG14 citations84
US6740595B2May 25, 2004
Etch process for recessing polysilicon in trench structures
INFINEON TECHNOLOGIES AG16 citations83
US6387771B1May 14, 2002
Low temperature oxidation of conductive layers for semiconductor fabrication
INFINEON TECHNOLOGIES AG18 citations83
US6605860B1Aug 12, 2003
Semiconductor structures and manufacturing methods
INFINEON TECHNOLOGIES AG10 citations73
US6429092B1Aug 6, 2002
Collar formation by selective oxide deposition
INFINEON TECHNOLOGIES AG7 citations73
US6352893B1Mar 5, 2002
Low temperature self-aligned collar formation
INFINEON TECHNOLOGIES AG13 citations73
US7046363B2May 16, 2006
Optical measurement system and method
INFINEON TECHNOLOGIES AG6 citations62
SIEMENS AG
4 patentsUS6156606ADec 5, 2000
Method of forming a trench capacitor using a rutile dielectric material
SIEMENS AG138 citations99
US6031614AFeb 29, 2000
Measurement system and method for measuring critical dimensions using ellipsometry
SIEMENS AG85 citations95
US6103585AAug 15, 2000
Method of forming deep trench capacitors
SIEMENS AG39 citations91
US5979244ANov 9, 1999
Method and apparatus for evaluating internal film stress at high lateral resolution
SIEMENS AG13 citations74