Inventor
KASUYA YOSHIKAZU
JP30 patents
⚠️ This page may combine multiple inventors who share the name “KASUYA YOSHIKAZU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEIKO EPSON CORP
28 patentsUS8637950B2Jan 28, 2014
Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
SEIKO EPSON CORP9 citations92
US7977233B2Jul 12, 2011
Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
SEIKO EPSON CORP7 citations92
US7802224B2Sep 21, 2010
Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
SEIKO EPSON CORP16 citations92
US7015542B2Mar 21, 2006
MONOS memory device
SEIKO EPSON CORP24 citations92
US6798015B2Sep 28, 2004
Semiconductor device and method of manufacturing the same
SEIKO EPSON CORP32 citations92
US6437455B2Aug 20, 2002
Semiconductor device having gate-gate, drain-drain, and drain-gate connecting layers and method of fabricating the same
SEIKO EPSON CORP24 citations92
US6404023B1Jun 11, 2002
Semiconductor device having gate-gate, drain-drain, and drain-gate connecting layers and method of fabricating the same
SEIKO EPSON CORP33 citations92
US10121741B2Nov 6, 2018
Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
SEIKO EPSON CORP3 citations84
US9455223B2Sep 27, 2016
Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
SEIKO EPSON CORP4 citations84
US8984466B2Mar 17, 2015
Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
SEIKO EPSON CORP4 citations84
US6753215B2Jun 22, 2004
Methods for manufacturing semiconductor devices and semiconductor devices
SEIKO EPSON CORP13 citations84
US6706579B2Mar 16, 2004
Method of manufacturing semiconductor device
SEIKO EPSON CORP16 citations84
US6664155B2Dec 16, 2003
Method of manufacturing semiconductor device with memory area and logic circuit area
SEIKO EPSON CORP16 citations84
US6605852B2Aug 12, 2003
Semiconductor device and method for manufacturing the same including forming a plurality of dummy convex regions on a matrix with a virtual linear line defining an angle
SEIKO EPSON CORP18 citations84
US6560765B2May 6, 2003
Method for generating mask data, mask and computer readable recording media
SEIKO EPSON CORP15 citations84
US6888250B2May 3, 2005
Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
SEIKO EPSON CORP9 citations82
US7271490B2Sep 18, 2007
Semiconductor device having dummy wiring layers and a method for manufacturing the same
SEIKO EPSON CORP6 citations74
US6784078B2Aug 31, 2004
Methods for manufacturing semiconductor devices and semiconductor devices
SEIKO EPSON CORP7 citations74
US6528414B1Mar 4, 2003
Methods for forming wiring line structures in semiconductor devices
SEIKO EPSON CORP8 citations74
US10679979B2Jun 9, 2020
Semiconductor device
SEIKO EPSON CORP1 citations73
US9978737B2May 22, 2018
Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
SEIKO EPSON CORP0 citations63
US6953967B2Oct 11, 2005
Semiconductor device and method of manufacturing the same
SEIKO EPSON CORP4 citations63
US6930000B2Aug 16, 2005
Method of manufacturing semiconductor device
SEIKO EPSON CORP3 citations63
US6762102B2Jul 13, 2004
Methods for manufacturing semiconductor devices and semiconductor devices
SEIKO EPSON CORP4 citations63
US10930635B2Feb 23, 2021
Semiconductor device
SEIKO EPSON CORP0 citations62
US9953922B2Apr 24, 2018
Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
SEIKO EPSON CORP0 citations52
US6815291B2Nov 9, 2004
Method of manufacturing semiconductor device
SEIKO EPSON CORP1 citations52
US7484280B2Feb 3, 2009
Method for manufacturing a surface acoustic wave element having an interdigital transducer (IDT) electrode
SEIKO EPSON CORP1 citations51
MORI KATSUMI
2 patentsUS8214776B2Jul 3, 2012
Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
MORI KATSUMI9 citations91
US8418114B2Apr 9, 2013
Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
MORI KATSUMI2 citations72