Inventor
VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS
NL17 patents
⚠️ This page may combine multiple inventors who share the name “VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
13 patentsUS9726985B2Aug 8, 2017
Stage system and a lithographic apparatus
ASML NETHERLANDS BV4 citations71
US10904994B2Jan 26, 2021
Supply system for an extreme ultraviolet light source
ASML NETHERLANDS BV0 citations60
US12197139B2Jan 14, 2025
Object holder, tool and method of manufacturing an object holder
ASML NETHERLANDS BV1 citations58
US10481498B2Nov 19, 2019
Droplet generator for lithographic apparatus, EUV source and lithographic apparatus
ASML NETHERLANDS BV1 citations57
US12235592B2Feb 25, 2025
Object holder, electrostatic sheet and method for making an electrostatic sheet
ASML NETHERLANDS BV0 citations56
US12591183B2Mar 31, 2026
Sensor positioning method, a positioning system, a lithographic apparatus, a metrology apparatus, and a device manufacturing method
ASML NETHERLANDS BV0 citations54
US7781237B2Aug 24, 2010
Alignment marker and lithographic apparatus and device manufacturing method using the same
ASML NETHERLANDS BV2 citations54
US7839489B2Nov 23, 2010
Assembly of a reticle holder and a reticle
ASML NETHERLANDS BV1 citations51
US10499485B2Dec 3, 2019
Supply system for an extreme ultraviolet light source
ASML NETHERLANDS BV0 citations50
US9921494B2Mar 20, 2018
Lithographic apparatus comprising an actuator, and method for protecting such actuator
ASML NETHERLANDS BV0 citations50
US7978307B2Jul 12, 2011
Gas bearing, and lithographic apparatus provided with such a bearing
ASML NETHERLANDS BV0 citations48
US9753381B2Sep 5, 2017
Substrate table system, lithographic apparatus and substrate table swapping method
ASML NETHERLANDS BV0 citations41
US10750604B2Aug 18, 2020
Droplet generator for lithographic apparatus, EUV source and lithographic apparatus
ASML NETHERLANDS BV0 citations36