Inventor
HAUSMANN DENNIS
US23 patents
⚠️ This page may combine multiple inventors who share the name “HAUSMANN DENNIS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NOVELLUS SYSTEMS INC
8 patentsUS7745346B2Jun 29, 2010
Method for improving process control and film conformality of PECVD film
NOVELLUS SYSTEMS INC538 citations96
US9070555B2Jun 30, 2015
Method for depositing a chlorine-free conformal sin film
NOVELLUS SYSTEMS INC31 citations94
US10043655B2Aug 7, 2018
Plasma activated conformal dielectric film deposition
NOVELLUS SYSTEMS INC28 citations93
US9570274B2Feb 14, 2017
Plasma activated conformal dielectric film deposition
NOVELLUS SYSTEMS INC30 citations93
US9670579B2Jun 6, 2017
Method for depositing a chlorine-free conformal SiN film
NOVELLUS SYSTEMS INC18 citations92
US7700155B1Apr 20, 2010
Method and apparatus for modulation of precursor exposure during a pulsed deposition process
NOVELLUS SYSTEMS INC2 citations60
US7550851B2Jun 23, 2009
Adhesion of tungsten nitride films to a silicon surface
NOVELLUS SYSTEMS INC4 citations60
US7160802B2Jan 9, 2007
Adhesion of tungsten nitride films to a silicon surface
NOVELLUS SYSTEMS INC3 citations60
LAM RES CORP
5 patentsUS9257274B2Feb 9, 2016
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
LAM RES CORP523 citations99
US10361076B2Jul 23, 2019
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
LAM RES CORP17 citations94
US9793110B2Oct 17, 2017
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
LAM RES CORP25 citations94
US10662526B2May 26, 2020
Method for selective deposition using a base-catalyzed inhibitor
LAM RES CORP4 citations71
US10643889B2May 5, 2020
Pre-treatment method to improve selectivity in a selective deposition process
LAM RES CORP2 citations71
HARVARD COLLEGE
4 patentsUS6969539B2Nov 29, 2005
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
HARVARD COLLEGE88 citations97
US7507848B2Mar 24, 2009
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
HARVARD COLLEGE18 citations92
US9905414B2Feb 27, 2018
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
HARVARD COLLEGE5 citations83
US8008743B2Aug 30, 2011
Vapor deposition of silicon dioxide nanolaminates
HARVARD COLLEGE4 citations61