Inventor
WISCHMEIER LARS
DE4 patents
Patents
4 patentsUS9874819B2Jan 23, 2018
Mirror array
ZEISS CARL SMT GMBH4 citations70
US11720028B2Aug 8, 2023
Measurement illumination optical unit for guiding illumination light into an object field of a projection exposure system for EUV lithography
ZEISS CARL SMT GMBH0 citations50
US10409167B2Sep 10, 2019
Method for illuminating an object field of a projection exposure system
ZEISS CARL SMT GMBH0 citations39
US9448490B2Sep 20, 2016
EUV lithography system
ZEISS CARL SMT GMBH0 citations39